Formation of a multi-nozzle ink jet
AssigneeFuji Xerox Co., Ltd.
InventorMasayoshi Tamai
Life of this patent
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Abstract
A method for the formation of a multi-nozzle ink jet is herein disclosed. In this method a single crystal silicon plate is masked and impurities are diffused upon its surface, creating regions of echant resistance. A second single crystal silicon plate is then grown onto the first, and is masked and etched. Due to the unisotropic etching properties of single crystal silicon plates, a groove is formed in the second plate, and a plurality of nozzles is formed in the first plate. This process yields a multi-nozzle ink jet of greater overall strength and utility, while eliminating the waste due to etching run common in the manufacture of conventional ink jets.
Claims6
A method for the formation of a multi-nozzle ink jet, comprising the steps of:
- masking the surface of a single crystal silicon plate;
- diffusing impurities onto the unmasked regions of said plate to render said unmasked regions resistant to known etching compositions;
- growing a second single crystal silicon plate onto said first single crystal silicon plate;
- masking the surface of said second single crystal silicon plate;
- and
- diffusing an etching composition onto said masked second single crystal silicon plate, whereby said etching composition creates an opening in said second single crystal silicon plate, and creates a plurality of nozzles in said first single crystal silicon plate.
Dependencies are inferred from the claim text.