Apparatus for supporting crystalline wafers
AssigneeWacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
InventorsBernd Schiele, Johann Niedermeier
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Abstract
A process and apparatus for supporting crystalline wafers utilizing the sion effect of flowing gas on the crystalline wafers. An almost point-like support of the crystalline wafer is achieved. Furthermore, the invention relates to a holding tool for carrying out the process, which tool has at the center of the holding face, a point-like projection.
Claims8
A holding tool which comprises a holding plate having a surface which faces an article being held, an annular nozzle, in the holding plate, formed by a conical hole and a conical guide cone, having a base, mounted in the conical hole with the base of the conical guide cone facing the article being held, a point-like projection, protroding from the center of the base of the conical guide cone, for contacting the article being held and means for providing a controlled flow of gas from the annular nozzle.
Dependencies are inferred from the claim text.