Electron beam exposing apparatus
AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorsTadahiro Takigawa, Isao Sasaki
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AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorsTadahiro Takigawa, Isao Sasaki
Estimating the term…
A variable shaping type electron beam exposing apparatus is provided which comprises an electron gun which irradiates an electron beam from the front end of a cathode chip; shaping plates having openings of variable shapes for shaping the electron beam irradiated from the electron gun into the shapes of these openings; and an objective lens for focusing the electron beam passed through the shaping plates into a predetermined shape on a sample. In this apparatus, the cathode chip is made of single-crystal lanthanum hexaboride whose axial orientation is <310>, the front end of it is formed into a circular conical shape, and half the vertical angle of the front end is set to be between 60.degree. and 85.degree.. The maximum area of the image on the sample is between 2 to 50 .mu.m.sup.2.
An electron beam exposing apparatus comprising:
Dependencies are inferred from the claim text.