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US 4,412,868 AGranted
Method of making integrated circuits utilizing ion implantation and selective epitaxial growth
AssigneeGeneral Electric Company
InventorsDale M. Brown, Kirby G. Vosburgh
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Abstract
A method of making an integrated circuit is described. The method includes providing a substrate of single crystal silicon semiconductor material having low minority carrier lifetime, forming an insulating layer of silicon dioxide overlying a major surface of the substrate, forming a plurality of apertures in the insulating layer which expose a plurality of selected portions of the major surface of the substrate, and epitaxially growing a layer of silicon on each of the selected portions of the major surfaces of the substrate.
Claims5
A method of making an integrated circuit comprising:
- providing a substrate of silicon semiconductor material,
- forming an insulating layer overlying a major surface of said substrate,
- forming a plurality of apertures in said insulating layer which expose a plurality of selected portions of said major surface of said substrate,
- implanting ions of oxygen in said substrate at a predetermined depth under each of said selected portions of said major surface of said substrate,
- annealing said substrate to repair the damage to the crytalline structure of the regions of said substrate adjacent said selected portions of said major surface caused by implanting said activators therein,
- said ions of oxygen being implanted in said substrate in a sufficiently high concentration and the annealing of said substrate being carried out at a temperature and for a time to convert said concentration of ions into a layer of silicon dioxide underlying each of said selected portions of said major surface of said substrate,
- growing epitaxially a layer of silicon on each of said selected portions of said major surface of said substrate.
4 more elements
Dependencies are inferred from the claim text.