# US 4,399,016 A · Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 4,399,016 A - Document ID: US4399016A - Status: Granted - Kind: A - Application number: 06/357,216 - Filed: 1982-03-11 - Granted: 1983-08-16 - Earliest claimed: 1981-03-12 - Assignees: Anelva Corporation - Inventors: Tsutomu Tsukada; Hideo Takei - Web page: https://patentgrep.com/patent/US4399016A ## CPC - H01J 37/32431: {Constructional details of the reactor} - C23C 14/50: Substrate holders - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract In a support member for supporting a sample processed in a hollow space between first and second electrodes between which a high frequency a.c. voltage is supplied to produce plasma in the hollow space, a conductor is laid on the first electrode with a first dielectric layer interposed therebetween and is covered with a second dielectric layer to be attached to the sample. A d.c. voltage source is connected through the first dielectric layer out of contact with the first electrode to induce electrostatic attraction during production of the plasma and, thereby, to fixedly attach the sample to the second dielectric layer. A temperature control member is embedded in the first electrode to control a temperature of the sample. The control member may be a cooling member or a heater. A plurality of the support members may be located on the first electrode. Preferably, the first and the second dielectric layers are of epoxy resin and polyimide resin, respectively. ## Claims ### Claim 1 In a plasma device for processing a sample by the use of plasma, comprising a chamber defining a hollow space therein, a first flat electrode member placed in said hollow space and having a first electrode surface, a second flat electrode member placed in said hollow space and having a second electrode surface directed towards said first electrode surface, support means having a first support surface to be brought into contact with said first electrode surface and a second support surface directed towards said second electrode surface for supporting said sample on said second support surface, a.c. voltage providing means for providing an a.c. voltage between said first and said second electrode members to produce said plasma between said first electrode member with said support means and said second electrode member, d.c. voltage producing means for producing a d.c. voltage to electrostatically couple said sample to said support means during production of said plasma and thereby to fixedly attach said sample to said second support surface, the improvement wherein: said second means comprises: a first dielectric layer defining said first support surface; a conductor placed on said first dielectric layer out of contact with said first electrode surface and electrically connected to said d.c. voltage producing means, with said first electrode member electrically insulated fron said d.c. voltage producing means; and a second dielectric layer covered on said conductor and defining said second support surface to which said sample is to be attached. ### Claim 2 (depends on 1) A plasma device as claimed in claim 1, further comprising insulating means laid internally of said first electrode member and extended to said conductor through said first dielectric layer for electrically insulating said d.c. voltage producing means from said first electrode member to connect said d.c. voltage producing means to said conductor out of contact with said first electrode member. ### Claim 3 (depends on 2) A plasma device as claimed in claim 2, wherein said second support surface is substantially equal in size to said sample. ### Claim 4 (depends on 3) A plasma device as claimed in claim 3, further comprising temperature control means buried in said first electrode member for controlling a temperature of said first electrode member. ### Claim 5 (depends on 4) A plasma device as claimed in claim 4, said temperature control means being for cooling said first electrode member by the use of a predetermined coolant, wherein said temperature control means comprises a conduit extended in said first electrode member for allowing said coolant to flow therethrough. ### Claim 6 (depends on 4) A plasma device as claimed in claim 4, wherein said temperature control means comprises a heater for heating said first electrode member. ### Claim 7 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, further comprising at least one of additional supporting means on said first electrode surface, said additional supporting means comprising structural elements corresponding to those of said supporting means recited in claim 1. ### Claim 8 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6 wherein said first dielectric layer is of epoxy resin including a ceramic filler. ### Claim 9 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, wherein said second dielectric layer comprises a film of a pressure sensitive adhesive which provides said second support surface. ### Claim 10 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, wherein said second dielectric layer comprises a coated film of a high molecular material selected from a group consisting of polyimide resin, silicone rubber, and epoxy resin. ### Claim 11 (depends on 10) A plasma device as claimed in claim 10, wherein said coated film includes a filler in addition to said high polymer material. ### Claim 12 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, wherein said conductor is of a metal, each of said first and said second dielectric layers being of an oxide of said metal. ### Claim 13 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, wherein each of said first and said second dielectric layers is of a material selected from a group consisting of ceramic, glass, and plastic. ### Claim 14 (depends on 1, 2, 3, 4, 5, 6) A plasma device as claimed in any one of claims 1 through 6, wherein each of said first and said second dielectric layers is of a sprayed metal oxide.