# US 4,398,341 A · Method of fabricating a highly conductive structure

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- Number: US 4,398,341 A
- Document ID: US4398341A
- Status: Granted
- Kind: A
- Application number: 06/304,436
- Filed: 1981-09-21
- Granted: 1983-08-16
- Earliest claimed: 1981-09-21
- Assignees: International Business Machines Corporation
- Inventors: Henry J. Geipel, Jr.; Larry A. Nesbit
- Web page: https://patentgrep.com/patent/US4398341A

## CPC

- H10P 76/202: {for lift-off processes}
- H10D 64/0132: {the conductor being a metallic silicide}
- H10D 64/01326: {Aspects related to lithography, isolation or planarisation of the conductor}
- H10P 95/00: Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10W 20/058: {by depositing on sacrificial masks, e.g. using lift-off}
- H10W 20/066: {by forming silicides of refractory metals}
- Y10S 438/951: Lift-off
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

An improved method of fabricating a silicide structure includes depositing a metal, e.g., molybdenum or tungsten, directly onto a thin insulating layer of silicon dioxide and/or silicon nitride formed on a semiconductor substrate, co-depositing the metal and silicon onto the metal layer and then depositing silicon onto the co-deposited metal-silicon layer. This structure is annealed at a temperature sufficient to form a metal silicide between the thin insulating layer and the layer of silicon. The silicon layer serves as a source of silicon for the metal layer which is consumed during the annealing step to form, along with the co-deposited metal-silicon layer, a relatively thick metal silicide layer directly on the thin silicon dioxide layer. A sufficiently thick silicon layer is initially provided on the co-deposited metal-silicon layer so that a portion of the initial silicon layer remains after the annealing step has been completed. This excess silicon may be oxidized to form a passivating layer on top of the thick metal silicide layer. If all or a part of the silicon in the remaining silicon layer after annealing is removed, the thick metal silicide layer may be exposed to an oxidizing ambient for self-passivation. In this latter instance, the pure metal precipitates in the silicide resulting in a line with even greater conductivity than a pure silicide line, which is very desirable for interconnections.

## Claims

### Claim 1

A method of making a conductive structure comprising the steps of:
depositing a layer of metal on an inert insulator,
depositing a layer of atomic mixture of metal and silicon on said metal layer,
depositing a layer of silicon on said layer of metal and silicon, and
annealing said structure so as to convert said layer of atomic mixture of metal and silicon and substantially all of said metal layer and at least a portion of said silicon layer into metal silicide.

### Claim 2 (depends on 1)

A method as set forth in claim 1 wherein only a portion of said silicon layer is converted into metal silicide and further including oxidizing the remaining portion of said silicon layer to form a passivating layer on said metal silicide layer.

### Claim 3 (depends on 2)

A method as set forth in claim 2 wherein said oxidizing step forms a layer of silicon dioxide.

### Claim 4 (depends on 1)

A method as set forth in claim 1 further including the step of etching at least some of the remaining portion of said silicon layer and oxidizing the remaining structure to form a passivating layer on said metal silicide layer.

### Claim 5 (depends on 4)

A method as set forth in claim 4 wherein said oxidizing step forms a layer of silicon dioxide and said metal of said metal layer and said metal of said layer of metal and silicon are the same type of metal.

### Claim 6 (depends on 1)

A method as set forth in claim 1 wherein said layer of atomic mixture of metal and silicon is deposited by co-evaporating said metal and silicon and said structure is annealed in an inert atmosphere.

### Claim 7 (depends on 6)

A method as set forth in claim 6 wherein said layers are formed by using electron beam evaporation techniques.

### Claim 8 (depends on 6)

A method as set forth in claim 6 wherein said layers are formed by first depositing the metal of said metal layer, then co-depositing the metal and silicon of said metal and silicon layer and finally depositing the silicon of said silicon layer.

### Claim 9 (depends on 8)

A method as set forth in claim 8 wherein said layers are deposited at a temperature between 100.degree. C. and 250.degree. C.

### Claim 10 (depends on 9)

A method as set forth in claim 9 wherein said layers are annealed at a temperature between 750.degree. C. and 1200.degree. C. for a period of time between 30 minutes and 60 minutes in an argon or nitrogen atmosphere.

### Claim 11 (depends on 10)

A method as set forth in claim 10 wherein said inert insulator has a thickness between 30 and 50 nanometers, said metal layer has a thickness between 30 and 60 nanometers, said layer of atomic mixture of metal and silicon has a thickness between 125 and 225 nanometers and said silicon layer has a thickness between 100 and 300 nanometers.

### Claim 12 (depends on 1)

A method as set forth in claim 1 wherein said metal is a refractory metal and said inert insulator includes a layer of silicon nitride deposited onto a semiconductor substrate.

### Claim 13

A method of making a silicide structure comprising the steps of:
growing a layer of insulation on a silicon substrate,
depositing a metal selected from the group consisting of molybdenum, tungsten, tantalum, titanium, cobalt and rhodium directly onto the surface of said insulation layer to form a metal layer,
co-depositing said metal and silicon onto the surface of said metal layer to form a composite metal-silicon layer,
depositing silicon onto said composite metal-silicon layer to form an intrinsic silicon layer, and
annealing said layers in an inert atmosphere at a temperature sufficient to convert said composite metal-silicon layer, said metal layer and at least a portion of said silicon layer into a silicide layer forming a first interface with said insulation layer and a second interface with the remaining portion of said silicon layer.

### Claim 14 (depends on 13)

A method as set forth in claim 13 wherein only a portion of said silicon layer is converted into a silicide layer and further including the step of oxidizing the remaining portion of said silicon layer to form a layer of silicon dioxide in contact with said silicide layer.

### Claim 15 (depends on 13)

A method as set forth in claim 13 further including the step of etching at least some of the remaining portion of said silicon layer and oxidizing the remaining structure to form a layer of silicon dioxide in contact with said silicide layer.

### Claim 16

A method of making a conductive structure comprising the steps of:
growing a layer of insulation on the surface of a semiconductor substrate,
depositing a layer of photoresist onto said insulation layer,
forming an opening in said photoresist layer to expose the surface of said insulation layer,
depositing a metal from the group consisting of molybdenum, tungsten, tantalum, cobalt, titanium and rhodium through said opening to form a metal layer directly in contact with said insulation layer,
co-depositing said metal and silicon through said opening to form a composite metal-silicon layer directly in contact with said metal layer,
depositing silicon through said opening to form a silicon layer in contact with said composite metal-silicon layer,
removing the remaining portion of said photoresist layer from the surface of said insulation layer, and
annealing said metal, composite metal-silicon and silicon layers at a temperature sufficient to convert said metal and composite metal-silicon layers and a portion of said silicon layer into a silicide layer forming a first interface with said insulation layer and a second interface with the remaining portion of said silicon layer.

### Claim 17 (depends on 16)

A method as set forth in claim 16 further including the step of oxidizing the remaining portion of said silicon layer to form a layer of silicon dioxide.

### Claim 18 (depends on 16)

A method as set forth in claim 16 further including the steps of etching at least some of the remaining portion of said silicon layer and oxidizing the remaining structure to form a layer of silicon dioxide.