# US 4,398,001 A · Terpolymer resist compositions

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- Number: US 4,398,001 A
- Document ID: US4398001A
- Status: Granted
- Kind: A
- Application number: 06/360,710
- Filed: 1982-03-22
- Granted: 1983-08-09
- Earliest claimed: 1982-03-22
- Assignees: International Business Machines Corporation
- Inventors: Ying Y. Cheng; Barbara D. Grant; Lester A. Pederson; Carlton G. Willson
- Web page: https://patentgrep.com/patent/US4398001A

## CPC

- G03F 7/039: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.

## Claims

### Claim 1

A resist composition comprising a novolac resin and a sensitizer characterized in that said sensitizer is a terpolymer of sulfur dioxide, an olefin hydrocarbon and an unsaturated ether, said terpolymer containing olefin monomer and sulfur dioxide in a ratio of 1 to 1, with the olefin monomer comprising hydrocarbon and ether in a ratio between 4:1 and 1:4.

### Claim 2 (depends on 1)

A resist composition as described in claim 1 wherein the olefinic hydrocarbon monomer is a 1,1-dialkylethylene.

### Claim 3 (depends on 1)

A resist composition as described in claim 1 wherein the olefinic hydrocarbon monomer is 2-methyl-1-pentene.

### Claim 4 (depends on 1)

A resist composition as described in claim 1 wherein the novolac is a cresylic acid novolac.

### Claim 5 (depends on 4)

A resist composition as described in claim 4 wherein the cresylic acid novolac has mw greater than 5000.

### Claim 6 (depends on 1)

A resist composition as described in claim 1 wherein the ether monomer is a 1-alkyl,1-alkoxyalkyl ethylene.

### Claim 7 (depends on 1)

A resist composition as described in claim 1 wherein the ether is a methallyl alkyl ether.

### Claim 8 (depends on 1)

A resist composition as described in claim 1 wherein the ether is 2-ethoxyethyl methallyl ether.

### Claim 9 (depends on 1)

A resist composition as described in claim 1 wherein the terpolymer is formed from SO.sub.2, 2-methyl-1-pentene and 2-ethoxyethyl methallyl ether.

### Claim 10 (depends on 9)

A resist composition as described in claim 9 wherein the hydrocarbon:ether monomer ratio is from 1:2 to 2:1.

### Claim 11 (depends on 9)

A resist composition as described in claim 9 wherein the intrinsic viscosity of the terpolymer in CHCl.sub.3 is 0.3 to 1.0.