# US 4,397,543 A · Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic process > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 4,397,543 A - Document ID: US4397543A - Status: Granted - Kind: A - Application number: 06/299,703 - Filed: 1981-09-08 - Granted: 1983-08-09 - Earliest claimed: 1980-12-29 - Assignees: International Business Machines Corporation - Inventors: Hartmut F. Kolbe; Frank A. Schwarzbach - Web page: https://patentgrep.com/patent/US4397543A ## CPC - G03F 9/70: {for microlithography (measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775)} - G03F 1/42: Alignment or registration features, e.g. alignment marks on the mask substrates - G03F 1/50: Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof - G03F 9/00: Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract The invention relates to a mask for imaging a pattern on a photoresist layer, with at least one alignment mark, to a method of making such a mask, and use of these masks for making semiconductor components. The masks made in accordance with the invention are obtained in such manner that in their production the patterns of adjacent chip fields are imaged to the effect that they overlap in their border lines containing the alignment marks. The process produces alignment marks representing the mean of at least two alignment marks of adjacent chip fields. By means of the above specified manufacturing process, the opto-mechanical imaging defects observed during mask production can be substantially eliminated. The masks as disclosed by the invention can be aligned in semiconductor processes with more precision than prior art masks. ## Claims ### Claim 1 Mask for imaging a pattern on a photoresist layer disposed on a semiconductor wafer having border lines separating chip fields, said mask including at least one alignment mark arranged in that mask area corresponding to said border lines on said semiconductor wafer, characterized in that the said at least one alignment mark represents the mean of at least two alignment marks of adjacent mask areas, said mean being the area formed by the one portion of adjacent alignment mark superimposed on a portion of at least one other adjacent alignment mark. ### Claim 2 (depends on 1) Mask as claimed in claim 1, characterized in that the alignment mark is arranged in that area of the mask which corresponds to the border lines on the semiconductor wafer. ### Claim 3 (depends on 1) Mask according to claim 1 characterized in that the said alignment mark is arranged in the area of the point of intersection of the border line with the middle line of the said chip fields. ### Claim 4 (depends on 1) Mask according to claim 1 characterized in that the alignment mark is arranged in the area of the border lines in the corners of the said individual chip fields. ### Claim 5 (depends on 1) Mask according to claim 1 characterized in that said mask consists of a multitude of identical chip fields. ### Claim 6 (depends on 1) Mask according to claim 1 characterized in that said masks consists of chromium. ### Claim 7 Method of making a mask for imaging a pattern on a photoresist layer with at least one alignment mask, characterized in that a reticle with the patterns of the respective chip field and of the alignment mark is periodically imaged with an n-fold reduction on a glass plate with a chromium and a photoresist layer, that the photoresist layer is developed, and the chromium layer is etched through the photoresist mask. ### Claim 8 (depends on 7) Method as claimed in claim 7, characterized in that the photochemical exposure of the recticle is effected in such a manner that the alignment marks of the one row of chip fields are superimposed by the alignment marks of the following row of chip fields, and that alignment marks are formed as a mean of at least two exposures. ### Claim 9 (depends on 7) Method as claimed in claim 7 characterized in that the alignment marks are imaged in that area of the mask which corresponds to the border line on the semiconductor wafer. ### Claim 10 (depends on 7) Use of masks with alignment marks made in accordance with claim 7, in a photolithographic process for making semiconductor components.