# US 4,396,708 A · Photographic light-sensitive material containing antistatic acid polymer

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- Number: US 4,396,708 A
- Document ID: US4396708A
- Status: Granted
- Kind: A
- Application number: 06/388,301
- Filed: 1982-06-14
- Granted: 1983-08-02
- Earliest claimed: 1981-06-12
- Assignees: Fuji Photo Film Co., Ltd.
- Inventors: Masashi Ogawa; Kunio Ishigaki; Taku Nakamura
- Web page: https://patentgrep.com/patent/US4396708A

## CPC

- G03C 1/89: Macromolecular substances therefor
- G03C: PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES (for photomechanical purposes G03F); PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY (photographic processes characterised by the use or manipulation of apparatus classifiable per se in subclass G03B, see G03B; photomechanical production of textured or patterned surfaces G03F; electrophotography, magnetography G03G)

## Abstract

A photographic light-sensitive material having at least one antistatic layer which contains gelatin and an antistatic agent. The antistatic agent being a polymer which is prepared by copolymerization of carboxylic acid group-containing monomers and monomers having such a functional group which reacts with gelatin resulting in the characteristic of greatly improved diffusion resistance.

## Claims

### Claim 1

A photographic light-sensitive material, comprising:
a support base;
a silver halide emulsion layer; and
an antistatic emulsion layer comprising a gelatin having dispersed therein a polymer having repeating units represented by the following general formula (I): ##STR62## wherein A represents a repeating unit derived from a copolymerizable ethylenic unsaturated monomer which contains at least one free carboxyl group or a salt thereof; R.sub.1 represents a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms; Q represents --CO.sub.2 --, ##STR63## or an arylene group having 6 to 10 carbon atoms; L represents a divalent group having 3 to 15 carbon atoms and containing at least one linkage selected from the group consisting of --CO.sub.2 -- and ##STR64## or a divalent group having 1 to 12 carbon atoms and containing at least one linkage selected from the group consisting of --O--, ##STR65## --CO--, --SO--, --SO.sub.2 --, --SO.sub.3 --, ##STR66## (wherein R.sub.1 has the same meaning as described above); R.sub.2 represents --CH.dbd.CH.sub.2 or --CH.sub.2 CH.sub.2 X (wherein X represents a group capable of being substituted with a nucleophilic group or a group capable of being released in a form of HX upon a base); and x and y represent percentages by mole fraction ranging from 50 to 99, and 1 to 50, respectively.

### Claim 2 (depends on 1)

The photographic light-sensitive material as claimed in claim 1, wherein A is a repeating unit derived from an ethylenic unsaturated monomer selected from the group consisting of: acrylic acid, methacrylic acid, itaconic acid, maleic acid, sodium acrylate, potassium acrylate, sodium methacrylate, ##STR67##

### Claim 3 (depends on 1)

The photographic light-sensitive material as claimed in claim 1, wherein A is a repeating unit derived from acrylic acid, methacrylic acid or maleic acid.

### Claim 4 (depends on 1)

The photographic light-sensitive material as claimed in claim 1, wherein R.sub.1 is a hydrogen atom or a methyl group.

### Claim 5 (depends on 2)

The photographic light-sensitive material as claimed in claim 2, wherein R.sub.2 is selected from the group consisting of --CH.dbd.CH.sub.2, --CH.sub.2 CH.sub.2 Br, --CH.sub.2 CH.sub.2 Cl, and ##STR68##

### Claim 6 (depends on 1, 3)

The photographic light-sensitive material as claimed in either of claims 1 or 3, wherein the polymer is present in an amount of from 10 wt% to 90 wt% based on the total weight of the antistatic emulsion layer.

### Claim 7 (depends on 4)

The photographic light-sensitive material as claimed in claim 4, wherein the polymer is present in an amount of from 20 wt% to 70 wt% based on the total weight of the antistatic emulsion layer.