# US 4,394,245 A · Sputtering apparatus

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 4,394,245 A
- Document ID: US4394245A
- Status: Granted
- Kind: A
- Application number: 06/346,959
- Filed: 1982-02-08
- Granted: 1983-07-19
- Earliest claimed: 1981-02-18
- Assignees: Hitachi, Ltd.
- Inventors: Yoshio Homma; Sukeyoshi Tsunekawa; Hiroshi Morisaki; Seiki Harada
- Web page: https://patentgrep.com/patent/US4394245A

## CPC

- H01J 37/3255: {Material}
- H01J 37/3408: {Planar magnetron sputtering}
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

Herein disclosed is a sputtering apparatus in which a substrate electrode has its electrode surface plate made of a soft magnetic material. The thickness distribution of the film deposited is made uniform by the use of the sputtering apparatus.

## Claims

### Claim 1

A sputtering apparatus comprising at least one cathode and at least one substrate electrode facing the cathode and having an electrode surface plate, the improvement wherein the electrode surface plate of said at least one substrate electrode facing said cathode has at least a portion thereof that is made of a soft magnetic material having an initial permeability of at least 100.

### Claim 2 (depends on 1)

A sputtering apparatus as set forth in claim 1, wherein said cathode is the planar magnetron high rate type cathode.

### Claim 3 (depends on 2)

A sputtering apparatus as set forth in claim 2, wherein at least 20% of the area of said electrode surface plate is made of said soft magnetic material.

### Claim 4 (depends on 2)

A sputtering apparatus as set forth in claim 2, wherein the entire area of said electrode surface plate is made of said soft magnetic material.

### Claim 5 (depends on 2)

A sputtering apparatus as set forth in claim 2, wherein said at least a portion of said electrode surface plate that is made of said soft magnetic material has a surface covered with a non-magnetic material.

### Claim 6 (depends on 2)

A sputtering apparatus as set forth in claim 2, wherein said at least a portion of said electrode surface place that is made of a soft magnetic material covers a portion of said electrode surface plate that is made of non-magnetic material.

### Claim 7 (depends on 2)

A sputtering apparatus as set forth in claim 2, wherein said electrode surface plate has its center portion made of a non-magnetic material having a high heat conductivity and its peripheral portion made of said soft magnetic material.

### Claim 8 (depends on 1)

A sputtering apparatus as set forth in claim 1, wherein said substrate electrode is connected through a power divider with a high-frequency power source.

### Claim 9 (depends on 1)

A sputtering apparatus as set forth in claim 1, wherein said at least a portion of said electrode surface plate that is made of said soft magnetic material has a thickness of at least 1 .mu.m.

### Claim 10 (depends on 1)

A sputtering apparatus as set forth in claim 1, wherein said soft magnetic material is comprised of iron or an iron alloy.

### Claim 11 (depends on 1)

A sputtering apparatus as set forth in claim 1, wherein the entire electrode surface plate is made from the soft magnetic material having an initial permeability of at least 100.