# US 4,393,131 A · Method for captivating a substrate within a holder > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 4,393,131 A - Document ID: US4393131A - Status: Granted - Kind: A - Application number: 06/362,938 - Filed: 1982-03-29 - Granted: 1983-07-12 - Earliest claimed: 1982-03-29 - Assignees: Motorola, Inc. - Inventors: Jeffery A. Whalin; Charles W. Shanley; Michael N. Scansaroli; Lawrence N. Dworsky - Web page: https://patentgrep.com/patent/US4393131A ## CPC - G03F 9/00: Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) - G03F 7/00: Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) - Y10T 29/42: Piezoelectric device making - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A method of captivating a substrate within a holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymerized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process. ## Claims ### Claim 1 A method of captivating a substrate within a holder for photolithographic processing comprising the steps of: placing a substrate having two opposed major surfaces within a holder, said holder having two opposed major surfaces and at least one aperture appropriately dimensioned for accepting said substrate; laminating a dry film photopolymer resist to at least one surface of said holder and said substrate, thereby captivating said substrate within the aperture of said holder; polymerizing said resist in desired areas including at least one uninterrupted area extending from one surface of said holder to a corresponding surface of said substrate; removing resist in the undesired areas, thereby leaving a retaining tab of resist in at least one uninterrupted area extending from one surface of said holder to one surface of said substrate. ### Claim 2 (depends on 1) A method in accordance with claim 1 wherein said polymerizing step is accomplished by exposing said dry film photopolymer resist to light of an appropriate wavelength for an appropriate length of time. ### Claim 3 (depends on 2) A method in accordance with claim 2 wherein the laminating step is accomplished by a heat laminating process. ### Claim 4 (depends on 3) A method in accordance with claim 3 further including the step of removing said substrate from said holder after resist is removed from undesired areas. ### Claim 5 (depends on 4) A method in accordance with claim 4 wherein the step of removing said substrate from said holder is accomplished by a process which cuts said retaining tabs. ### Claim 6 (depends on 4) A method in accordance with claim 4 wherein the step of removing said substrate from said holder is accomplished by a punching process. ### Claim 7 (depends on 4) A method in accordance with claim 4 further including the step of dissolving all resist from the surfaces of said substrate with an appropriate solvent as the last step. ### Claim 8 (depends on 7) A method in accordance with claim 7 further including the step of selecting an acetone solution for said solvent prior to said dissolving step. ### Claim 9 (depends on 7) A method in accordance with claim 7 wherein said dry film photopolymer resist is exposed by passing light through photolithographic masks during the exposing step. ### Claim 10 (depends on 9) A method in accordance with claim 9 wherein said photolithographic masks are in contact with said dry film photopolymer resist during the exposing step. ### Claim 11 (depends on 10) A method in accordance with claim 10 further including the step of, providing said holder with drive holes spaced at regular intervals along the length and near an edge of said holder, prior to the placing step. ### Claim 12 (depends on 11) A method in accordance with claim 11 wherein said drive holes are compatible with 35 mm photographic film drive equipment. ### Claim 13 (depends on 11) A method in accordance with claim 11 further including the step of choosing stainless steel for the material from which said holder is made prior to the step of providing said holder. ### Claim 14 (depends on 11) A method in accordance with claim 11 including the step of plating metal on a surface of said substrate after resist is removed from undesired areas. ### Claim 15 (depends on 11) A method in accordance with claim 11 further including the step of metal plating said substrate on at least one surface prior to the step of placing said substrate. ### Claim 16 (depends on 15) A method in accordance with claim 15 further including the step of etching said metal plating after resist is removed from undesired areas. ### Claim 17 (depends on 15) A method in accordance with claim 15 further including the step of selecting aluminum for said metal prior to the plating step. ### Claim 18 (depends on 14, 16) A method in accordance with claim 14 or 16 further including the step of selecting quartz for the substrate material as a first step in the process. ### Claim 19 (depends on 1) A substrate processed in accordance with the method of claim 1. ### Claim 20 A method of captivating a quartz crystal device within a holder for photolithographic processing comprising the steps of: placing a quartz crystal having two opposed major surfaces, at least one of said surfaces being uniformly plated with aluminum, within a holder having two opposed major surfaces, said holder having at least one aperture appropriately dimensioned for accepting said crystal; laminating a dry film photopolymer resist to at least one surface of said holder and at least one aluminum plated surface of said quartz crystal, thereby captivating said quartz crystal within the aperture of said holder; exposing said resist to light passed through a photolithographic mask causing polymerization in desired areas including at least one uninterrupted area extending from the surface of said holder to the surface of said quartz crystal; removing unpolymerized resist, thereby leaving retaining tabs in at least one uninterrupted area extending from the surface of said holder to the surface of said quartz crystal, etching away said aluminum from areas exposed by removing unpolymerized resist. ### Claim 21 (depends on 20) A quartz crystal device processed in accordance with claim 20. ### Claim 22 A method of captivating a quartz crystal within a holder for photolithographic processing comprising the steps of: providing a quartz crystal having two opposed major surfaces, said surfaces being uniformly aluminum plated; providing a stainless steel holder having two opposed major surfaces and drive holes spaced at regular intervals along the length of said holder near its edges rendering said holder compatible with 35 MM photographic film drive equipment, said holder having a plurality of apertures appropriately dimensioned for accepting said crystal; placing said quartz crystal within the aperture of said holder forming a first assembly having two opposed major surfaces; heat laminating a dry film photopolymer resist to both surfaces of said first assembly by passing said first assembly with resist on each surface between heated rollers to form a second assembly, sandwiching said second assembly between and substantially in contact with two photolithograph glass masks, polymerizing desired areas of said resist on both surfaces simultaneously by passing ultra-violet light through said masks including at least one uninterrupted area extending from the surface of said holder to the surface of said crystal, passing said second assembly through a developing agent suitable for removing unpolymerized resist, passing said second assembly through a solution suitable for etching aluminum, removing said crystal from said holder, dissolving polymerized resist using acetone. ### Claim 23 A method of captivating a substrate within a holder for photolithographic processing comprising the steps of: placing a substrate having two opposed major surfaces within a holder, said holder having two opposed major surfaces and at least one aperture appropriately dimensioned for accepting said substrate; laminating a dry film photopolymer resist to at least one surface of said holder and said substrate, thereby captivating said substrate within the aperture of said holder; polymerizing said resist in a manner which allows removal of resist in certain areas while leaving at least one uninterrupted area extending from one surface of said holder to a corresponding surface of said substrate; and removing resist in certain areas, thereby leaving a retaining tab of resist in at least one uninterrupted area extending from one surface of said holder to one surface of said substrate. ### Claim 24 (depends on 23) A substrate processed in accordance with claim 23.