# US 4,392,930 A · Photopolymerizable resins

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- Number: US 4,392,930 A
- Document ID: US4392930A
- Status: Granted
- Kind: A
- Application number: 06/393,894
- Filed: 1982-06-30
- Granted: 1983-07-12
- Earliest claimed: 1981-07-09
- Assignees: Ciba-Geigy Corporation
- Inventors: Roderick D. Hathaway; Edward Irving; John S. Waterhouse
- Web page: https://patentgrep.com/patent/US4392930A

## CPC

- C08F 20/36: containing oxygen in addition to the carboxy oxygen {, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate}
- C08F 2/48: by ultraviolet or visible light
- G03F 7/027: Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Diacrylates or dimethacrylates, which are compatible with water before exposure to actinic radiation but after such exposure form hard, insoluble, coatings which are resistant to organic solvents and to water, are made by reaction with (meth)acrylic acid, or with a dicarboxylic acid and a hydroxy group-containing (meth)acrylate, of epoxide groups in an advanced diepoxide resin containing groups of formula ##STR1## where R.sup.4 denotes a divalent (cyclo)aliphatic or araliphatic radical, each R.sup.15 denotes an alkyl group or each pair of R.sup.15 denotes a group of formula --CH.sub.2).sub.2 --, --C(R.sup.16 R.sup.17)CO--, --CH.sub.2 CH(CH.sub.3)--, --CH.sub.2 --.sub.3, or --CO--.sub.2, wherein R.sup.16 and R.sup.17 each represent a hydrogen atom, an alkyl group, or, conjointly, a cycloaliphatic ring, and c is zero or 1.

## Claims

### Claim 1

A photopolymerizable resin of the formula ##STR19## where b represents zero or 1,
e is an integer of average value at least 1,
each R.sup.10 denotes a hydrogen atom or a methyl group,
each R.sup.11 represents the organic divalent residue of a compound having two glycidyl groups directly attached to an atom or atoms of oxygen, nitrogen, or sulfur, after removal of the said two glycidyl groups,
each R.sup.12 represents the divalent residue of a dihydric alcohol, a dihydric phenol, a saturated dicarboxylic acid of 2 to 8 carbon atoms, or a compound containing two groups selected from amide groups and imide groups, after removal of two terminal hydrogen atoms attached to an oxygen or nitrogen atom or atoms,
each R.sup.13 denotes an alkylene group of 1 to 6 carbon atoms, an alkenylene group of 2 to 10 carbon atoms, an arylene group of 6 to 10 carbon atoms, or a cycloalkylene or cycloalkenylene group of 5 to 8 carbon atoms,
each R.sup.14 denotes a divalent aliphatic, cycloaliphatic, or araliphatic group of 2 to 8 carbon atoms,
with the proviso that at least 25% of the total of the (e+1) R.sup.11 and e R.sup.12 groups each represent a group of the formula ##STR20## where R.sup.4 represents a divalent aliphatic, cycloaliphatic, or araliphatic radical of 1 to 8 carbon atoms,
c denotes zero or 1, and
each R.sup.15 denotes an alkyl group of 1 to 4 carbon atoms or each pair of R.sup.15 conjointly represents a group of formula --CH.sub.2 CH.sub.2 --, --C(R.sup.16 R.sup.17)CO--, ##STR21## --CH.sub.2 CH.sub.2 CH.sub.2 --, or --COCO--, wherein R.sup.16 and R.sup.17 each denote a hydrogen atom or a straight or branched alkyl group of up to 9 carbon atoms or R.sup.16 and R.sup.17 may together denote tetramethylene, pentamethylene, methylpentamethylene, or hexamethylene.

### Claim 2 (depends on 1)

A resin of claim 1 in which b in formula VIII represents zero.

### Claim 3 (depends on 1)

A resin of claim 1 in which e in formula VIII represents an integer of average value of at most 10.

### Claim 4 (depends on 1)

A resin of claim 1 in which at most 75% of the total of the (e+l) R.sup.11 and e R.sup.12 groups represent a group of formula IX and the remainder of the R.sup.11 and R.sup.12 groups each denote an oxyalkyleneoxy group of 2 to 40 carbon atoms, an oxyalkyleneoxy group of 2 to 40 carbon atoms interrupted in the chain by at least one ether oxygen atom, or an oxyaryleneoxy group of to to 18 carbon atoms.

### Claim 5 (depends on 4)

A resin of claim 4 in which the alkylene component of the said oyalkyleneoxy group comprises either a chain of 3 to 6 consecutive carbon atoms or a chain of 4 to 28 carbon atoms which is interrupted by at least one ether oxygen atom, and the oxyaryleneoxy group is either a oxyphenyleneoxy group or a group of formula ##STR22## where R.sup.18 represents a carbon-carbon bond, an ether oxygen atom, a carbonyl group, a sulfonyl group, a methylene group, or an isopropylidene group.

### Claim 6 (depends on 1)

A process for the preparation of a resin according to claim 1 in which b in formula VIII represents zero, comprising reaction of the indicated epoxide groups in an advanced diepoxide of formula ##STR23## with acrylic acid or methacrylic acid.

### Claim 7 (depends on 1)

A process for the preparation of a resin according to claim 1 in which b in formula VIII represents 1, comprising reaction of an advanced diepoxide of formula ##STR24## with a dicarboxylic acid of formula
HOOC--R.sup.13 --COOH XXVII
or an anhydride of a said dicarboxylic acid, followed by esterification of the thus formed terminal carboxylic acid groups with a hydroxyl group-containing ester having the formula ##STR25##

### Claim 8 (depends on 1)

A method of polymerising a resin according to claim 1 which comprises subjecting a layer of the resin on a support to actinic radiation.

### Claim 9 (depends on 8)

The method of claim 8 in which the resin has been applied to the support in water-borne form.
