# US 4,391,897 A · Diazo lithographic printing plate developing process

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- Number: US 4,391,897 A
- Document ID: US4391897A
- Status: Granted
- Kind: A
- Application number: 06/274,341
- Filed: 1981-06-17
- Granted: 1983-07-05
- Earliest claimed: 1979-10-12
- Assignees: Howard A. Fromson
- Inventors: Robert F. Gracia; Howard A. Fromson
- Web page: https://patentgrep.com/patent/US4391897A

## CPC

- G03F 7/32: Liquid compositions therefor, e.g. developers
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Process for removing unexposed diazo from a silicated aluminum lithographic printing plate having a hydrophilic, anionic, negatively charged surface and a layer of a light sensitive, cationic diazo material which has been selectively exposed to actinic light in an image area. The plate is contacted after exposure with a solution of an anionic material in water. Anionic material from the solution ionically couples with unexposed diazo material and the solution still containing anionic material dissolves the coupled product from the unexposed areas producing a clean, hydrophilic background.

## Claims

### Claim 1

Process for removing unexposed diazo from a lithographic printing plate comprising a silicated aluminum substrate having a hydrophilic, anionic, negatively charged surface and on and bonded to the substrate, a light sensitive, cationic, positively charged, water-soluble diazo material which has been selectively exposed to actinic light in an image area which comprises contacting the plate after exposure with a solution consisting essentially of an anionic material in water in a quantity and for a time sufficient to couple the diazo with the anionic material and dissolve the coupled product from the non-image area thereby overcoming the bond between the diazo and the substrate leaving a clean, hydrophilic non-image area.

### Claim 2 (depends on 1)

Process of claim 1 wherein the plate after exposure is immersed in said solution.

### Claim 3 (depends on 1)

Process of claim 1 wherein the exposed surface is flooded with said solution.

### Claim 4 (depends on 1)

Process of claim 1 wherein said solution is at a temperature of from 18.degree. to 90.degree. C.

### Claim 5 (depends on 1)

Process of claim 1 wherein the anionic material is selected from the group of alkali metal salts of alkylaryl sulfonates, alkali metal salts of alkyl sulfonates and alkali metal and ammonium salts of sulfated higher fatty alcohols.

### Claim 6

Process for removing unexposed diazo from a lithographic printing plate consisting essentially of providing a silicated aluminum substrate having a hydrophilic, anionic, negatively charged surface and on and bonded to the substrate, a light sensitive coating consisting essentially of a cationic, positively charge, water-soluble diazo material which has been selectively exposed to actinic light in an image area, contacting the plate after exposure with a solution consisting essentially of an anionic material in water in a quantity and for a time sufficient to couple the diazo with the anionic material and dissolve the coupled product from the non-image area thereby overcoming the bond between the diazo and the substrate leaving a clean, hydrophilic non-image area and rinsing with water.