Light exposure device and method
AssigneeHitachi, Ltd.
InventorsNobuyuki Akiyama, Yukio Kembo, Yasuo Nakagawa, Susumu Aiuchi, Mineo Nomoto
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AssigneeHitachi, Ltd.
InventorsNobuyuki Akiyama, Yukio Kembo, Yasuo Nakagawa, Susumu Aiuchi, Mineo Nomoto
Estimating the term…
A light exposure device and method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface of the substrate, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposure surface and deforming means for imparting a force to the back surface of the substrate to deform the substrate, and control means for controlling the deforming means of the chuck in accordance with the curvature of the exposure surface of the substrate measured by the measuring means such that the exposure surface of the substrate conforms to an image surface of the pattern over an entire exposure area within a predetermined allowable error.
A device for exposing and printing a predetermined pattern on an exposure surface of a substrate, the device comprising:
A device for exposing and printing a predetermined pattern on an exposure surface of a substrate, the device comprising:
A device for exposing and printing a predetermined pattern on an exposure surface of a substrate, the device comprising:
A light exposure device for exposing and printing a predetermined pattern on an exposure surface of the substrate, comprising:
A device for exposing and printing a predetermined pattern on an exposure surface of a substrate, the device comprising:
A method for exposing and printing a predetermined pattern on an exposure surface of a substrate, the method comprising the steps of:
Dependencies are inferred from the claim text.