Apparatus for regulating substrate temperature in a continuous plasma deposition process
AssigneeEnergy Conversion Devices, Inc.
InventorRobert F. Edgerton
Life of this patent
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Abstract
Apparatus for raising a continuous substrate to a predetermined deposition temperature and thereafter maintaining it at that temperature as it advances through a glow discharge chamber. A lamp holder having a plurality of heater lamps extends substantially the length of the chamber. The lamps are selectively spaced apart along the length of travel of said substrate to provide a desired heating profile. A detector is engaged to control circuitry for continuously adjusting the intensity of the lamps to regulate substrate temperature.
Claims4
Apparatus for heating a continuous substrate to a predetermined deposition temperature as it travels through at least one glow discharge chamber, said apparatus comprising:
- a heater, said heater including a plurality of heater lamps within said glow discharge chamber spaced along the direction of travel of said substrate, the spacing between adjacent lamps increasing along said direction of travel so that the temperature of said continuous substrate is rapidly heated to and maintained at said predetermined deposition temperature as it travels through said chamber;
- a detector for monitoring the temperature of said substrate, said detector including means responsive to infrared radiation of about 5 microns in wavelength;
- and
- a feedback control circuit coupled to said detector for adjusting the intensity of said lamps in response to the temperature of said substrate, said circuit being responsive to the output of said detector to produce a signal to control the intensity of each of said lamps.
Dependencies are inferred from the claim text.