Method for repairing glass photomasks
AssigneePPG Industries, Inc.
InventorDennis S. Postupack
Life of this patent
Estimating the term…
Abstract
A method for repairing defects in the form of discontinuities in a photomask pattern in or on a glass substrate by means of electroless deposition of a nickel-containing coating on the surface of a glass substrate is disclosed.
Claims9
In a method of making a patterned photomask plate utilizing a glass substrate for use in a photofabrication process, wherein defects appear as discontinuities in the photomask pattern, the improvement which comprises contacting said defect area with a solution of a nickel compound comprising reducible nickel ions and a solution of a reducing agent capable of reducing said nickel ions in order to deposit a nickel-containing coating having a sufficient density to mask actinic radiation employed in said photofabrication process.
Dependencies are inferred from the claim text.