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US 4,377,818 AGranted
High density electrically programmable ROM
AssigneeTexas Instruments Incorporated
InventorsChang-Kiang Kuo, Shyh-Chang Tsaur
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Abstract
An electrically programmable memory array of the floating gate type is made by a process which allows the edges of the floating gates to be aligned with the edges of the control gates which also form address lines. Contacts to individual cells are not needed. These factors provide a very small cell size. The source and drain regions are formed prior to applying the first level polysilicon then covered with thick oxide, rather than using the polysilicon as a mask to define the gate areas.
Claims3
A semiconductor device comprising:
- a plurality of parallel elongated heavily doped regions of one conductivity type in a face of a body of semiconductor material of opposite conductivity type, such regions covered by field oxide at said face,
- a first layer of polycrystalline silicon overlying said face forming electrodes located between the heavily doped regions and also overlying the heavily doped regions by a significant amount,
- a second layer of polycrystalline silicon on said face overlying the first layer and defining a plurality of elongated strips perpendicular to the heavily doped regions and overlying such regions, the second layer having edges coinciding with edges of the first layer.
Dependencies are inferred from the claim text.