Method and apparatus for producing electron beam diffraction patterns
OwnerGunter Rauscher, Helmut Formanekinventors
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OwnerGunter Rauscher, Helmut Formanekinventors
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A method is disclosed of producing electron beam diffraction patterns, in which the object to be examined is one which is liable to be altered substantially by an electron beam when that beam is accelerated by a predetermined voltage to the energy density necessary for the production of an image. The object is irradiated by an electron beam and the electrons of the electron beam, diffracted by the object, are imaged using an integrating image apparatus or an integrating image material, for example a photographic layer. One or more regions of the object corresponding in size to the cross section of the electron beam are irradiated intermittently using an electron beam accelerated by the pre-determined voltage, the electron beam having an electron density which is lower than the electron density at which the object is substantially altered. Irradiation is carried out for such a period of time that the electron density of the electron beam, integrated during this time, is at least equal to the electron density necessary to produce an image.
A method of producing electron beam diffraction patterns, in which an object to be examined is irradiated by means of an electron beam accelerated by a predetermined voltage, the electrons of an electron beam diffracted by the object producing an image on an integrating image apparatus or an integrating image material, the object being examined being an organic or biological substance having a periodic structure, wherein said electron beam has an electron density of less than one electron per square Angstrom, wherein at least one region of the object corresponding in size to the cross section of the electron beam is irradiated intermittently using an electron beam accelerated by the pre-determined voltage, and wherein irradiation is carried out over such a period of time that the electron density of the electron beam, integrated during this time, is at least equal to the electron density necessary to produce an image, whereby the amount of electron density received at each point of the object is limited.
An apparatus for producing electron beam diffraction patterns, comprising an electron beam device for producing a focussed electron beam, said beam having a density which is less than one electron per square Angstrom;
An apparatus for producing electron beam diffraction patterns, comprising an electron beam device for producing a focussed electron beam, said electron beam having a density of less than one electron per square Angstrom;
Dependencies are inferred from the claim text.