Dry etching device comprising a member for bringing a specimen into electrical contact with a grounded electrode
AssigneeAnelva Corporation
InventorsTsutomu Tsukada, Katsumi Ukai
Life of this patent
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Abstract
In a dry etching device comprising a first electrode supplied with an electrical voltage and a second electrode grounded, a dielectric plate is placed on the second electrode and includes means for positioning a specimen to be etched. The specimen is brought into electrical contact with the second electrode by the positioning means and is, therefore, substantially grounded during etching. The positioning means may be a through hole for receiving the specimen therein. Alternatively, the positioning member may be a conductive spring passing through the dielectric plate. A plurality of positioning members may be arranged in the dielectric plate.
Claims4
A dry etching device for etching a substantially conductive specimen by the use of a gas plasma, said device comprising a chamber defining therein a hollow space adapted to be exhausted and then filled with a preselected reactive gas;
- a first electrode positioned in said space and having a first surface;
- a second electrode positioned in said space and having a second surface opposite to said first surface;
- means for applying an RF voltage of predetermined frequency to said first electrode with said second electrode grounded to thereby develop said gas plasma in said space between said first and said second surfaces;
- and a dielectric plate member having a back surface brought into contact with said second surface and a front surface directed towards said first surface, the improvement wherein said plate member includes positioning means for positioning said specimen in contact with said second surface to substantially ground said specimen.
Dependencies are inferred from the claim text.