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US 4,376,137 AGranted
Method of fabricating a bi-level magnetic bubble propagation circuit
AssigneeRockwell International Corporation
InventorsIsoris S. Gergis, Wai-Tak P. Lee
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Abstract
A bi-level magnetic bubble domain propagation structure in which the domain guide structure is formed by a spatially periodic pattern of permalloy implemented on two discrete levels separated by a substantially vertical gap. The structure forms a complementary pattern of contiguous disks, and the complementary image of such disks.
Claims4
A method of fabricating a magnetic bubble domain propagation structure comprising the steps of:
- providing on a body a magnetic garnet layer in which magnetic bubble domains can be propagated;
- depositing a first layer of dielectric material on said magnetic garnet layer;
- depositing a layer of photoresist on said first layer of dielectric material;
- selectively removing portions of said layer of photoresist to form a first pattern of photoresist on said dielectric layer;
- depositing a second layer of dielectric material on the pattern of photoresist and the exposed first layer of dielectric material;
- selectively removing portions of said second layer of dielectric material and said layer of photoresist so that the edge of the pattern of said first layer is aligned with edge of second layer;
- and
- depositing a single layer of permalloy over said first and second layers of dielectric material.
5 more elements
Dependencies are inferred from the claim text.