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US 4,374,972 AGranted
Coating solution of polyetherimide oligomers
AssigneeGeneral Electric Company
InventorsDonald A. Bolon, Thomas B. Gorczyca
Life of this patent
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Abstract
Disclosed is a coating solution including an oligomeric polyetherimide component, an organic diamine component, an organic triamine component, a solvent system and optionally water, which may be coated on a substrate and polymerized to form high quality polyetherimide coatings and a process for preparing the solution.
Claims20
A process for preparing a coating solution including oligomeric polyetherimides comprising:
- (a) reacting at least one aromatic bis(ether anhydride of the formula:
- ##STR12## with less than a stoichometric amount of at least one diamine of the general formula:
- H.sub.2 N--R.sup.1 --NH.sub.2
- in a suitable solvent to form oligomeric polyetheramic acids containing termanal anhydride groups
- (b) heating the solution of (a) to form oligomeric polyetherimide anhydrides
- (c) hydrolizing the oligomeric anhydrides of (b) to form the free acids of the formula:
- ##STR13## (d) adding to the oligomer solution of (c) triamines of the general formula:
- R.sup.2 (NH.sub.2).sub.3,
- and more of the same or different diamine, where R is a member selected from the class consisting of (A) divalent organic radicals having the following formulas:
- ##STR14## and (B) divalent organic radicals of the general formula:
- ##STR15## where m is 0 or 1 and X is a member selected from the class consisting of divalent radicals of the formulas, ##STR16## where y is an integer from 1 to 4;
- R.sup.1 is a divalent organic radical selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6 to about 20 carbon atoms and haloginated derivatives thereof, (b) alkylene radicals having from 2 to about 20 carbon atoms, and cycloalkylene radicals having from 3 to about 30 carbon atoms, (c) from C.sub.2 to about C.sub.8 alkylene terminated polydiorganosiloxane, and (d) divalent radicals of the general formula:
- ##STR17## where m is as previously defined and Q is a member selected from the class consisting of ##STR18## where x is an integer from 1 to 5 inclusive, R.sup.2 is a member selected from the class consisting of (a) the following trivalent aromatic radicals ##STR19## and (b) trivalent aliphatic radicals;
- ##STR20## and n is an integer from 0 to 100.
11 more elements
Dependencies are inferred from the claim text.