Antistatic silver halide photographic light-sensitive material

A silver halide photographic light-sensitive material having at least one antistatic layer of low surface electric resistance, good adhesion and which does not suffer from scum during development as an outermost backing layer, said antistatic layer containing a dispersion of a polymer represented by the following formula (I):

• ##STR18## wherein A represents a monomer unit formed from a copolymerizable monomer having at least two ethylenically unsaturated groups, B represents a monomer unit formed from a copolymerizable and monethylenically unsaturated monomer, R.sub.1 represents a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms, Q represents a divalent group containing 1 to 12 carbon atoms, wherein Q is selected from the class consisting of --O--R.sub.6 and --NH--R.sub.6 --, wherein R.sub.6 is an alkylene group containing 1 to 6 carbon atoms, R.sub.2, R.sub.3 and R.sub.4 may be the same or different and each represents an alkyl group containing 1 to 20 carbon atoms, or an aralkyl group containing 7 to 20 carbon atoms, or R.sub.2, R.sub.3 and R.sub.4 may combine to form a ring together with the nitrogen atom, X.sup..crclbar. represents an anion, x is about 0.25 to 10 mol%, y is about 0 to 90 mol%, and z is about 10 to 99 mol%.