US 4,374,836 A · Antisecretory heterocyclic derivatives, process for their manufacture and pharmaceutical compositions containing them

Abstract

The invention relates to a heterocyclic derivative of the formula: ##STR1## where D is O, S or NH; E is CH or when D is O or S, E is N; Y is S, O, CH.sub.2, SO or a direct bond; m is 0 to 4 and n is 1 to 4, provided that when Y is S, O or SO m is 1 to 4, when Y is O or SO, n is 2 to 4; A is C.sub.(3-4) chain comprising at least one C and also optionally S, N, 2N or N and S, and also comprising C.dbd.O or C.dbd.S or where possible SO.sub.2, the chain optionally substituted by 1 or 2 C.sub.(1-6) alkyl, benzyl, naphthylmethyl, 2-phenethyl, 4-phenylbutyl, pyridylmethyl, thiazolylmethyl, thienylmethyl, benzyloxy, pyridylmethoxy or phenoxymethyl radicals each optionally substituted on the aromatic ring system by 1 to 3 halogen atoms or methyl, methoxy, trifluoromethyl, dimethylamino, phenyl or phenoxy radicals; and the salts thereof.

Claims13

Dependent claims

A heterocyclic derivative of the following formula (I):

##STR6## in which D is an oxygen or sulphur atom or an NH radical;
E is a CH radical or, when D is an oxygen or sulphur atom, E is a nitrogen atom;
Y is a sulphur or oxygen atom, a direct bond or a methylene or sulphinyl radical;
m is 0 to 4 and n is 1 to 4, provided that when Y is a sulphur or oxygen atom or a sulphinyl radical m is 1 to 4, and when Y is an oxygen atom or a sulphinyl radical, n is 2 to 4;
and
the ring which includes chain A is of the following formula (II):
##STR7## in which Z is an oxygen or sulphur atom;
and
R.sup.1 and R.sup.2, which may be the same or different, are hydrogen atoms or are radicals selected from alkyl radicals of 1 to 6 carbon atoms, and benzyl, naphthylmethyl, 2-phenethyl, 4-phenylbutyl, pyridylmethyl, thiazolylmethyl, thienylmethyl, benzyloxy, pyridylmethoxy and phenoxymethyl radicals each optionally substituted on the aromatic ring system by one to three substitutents selected from halogen atoms and methyl, methoxy, trifluromethyl, dimethylamino, phenyl and phenoxy radicals;
and the pharmaceutically-acceptable acid-addition salts thereof.

7 more elements

Dependencies are inferred from the claim text.

Antisecretory heterocyclic derivatives, process for their manufacture and pharmaceutical compositions containing them

Life of this patent

Antisecretory heterocyclic derivatives, process for their manufacture and pharmaceutical compositions containing them

Life of this patent

Abstract

Claims13