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US 4,371,955 AGranted
Charge-pumping MOS FET memory device
AssigneeFujitsu Limited
InventorNobuo Sasaki
Life of this patent
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Abstract
In a semiconductor layer of either conductivity type, a central region having a low threshold voltage and side regions having a high threshold voltage are formed between a source regio
Claims12
A semiconductor memory device comprising:
- an electrically floating semiconductor layer;
- a source and a drain region formed in said semiconductor layer;
- a gate insulating layer formed on said semiconductor layer and a gate electrode formed on said insulating layer;
- said memory device having a threshold voltage for conduction of a first value and normally storing one of "0" and "1" information values;
- means for selectively applying a gate voltage to said gate electrode exceeding said first threshold voltage value of said device to produce a bias voltage in said semiconductor layer, said semiconductor layer storing said bias voltage produced by said gate voltage and establishing thereby a threshold voltage of a second value different from said first value, thereby to store the other of said "0" and "1" information values;
- said memory device selectively storing "0" and "1" information values in accordance with a desired, predetermined relationship of said "0" and "1" information values and said different bias and corresponding threshold voltage values;
- said semiconductor layer further comprising a central region having a low threshold voltage and side regions having a high threshold voltage, formed in said semiconductor layer between said source region and said drain region;
- said first voltage threshold value being determined by said high threshold voltage of said side regions, and said side regions undergoing pinch-off prior to pinch-off occurring in said central region upon removal of said selectively applied gate voltage and
- means for producing a read-out current from said memory device, the level of the read-out current differing in accordance with the different bias and corresponding threshold voltage values and thereby affording read-out of the information value stored in said memory device.
6 more elements
A semiconductor memory device for storing information, comprising:
- an electrically floating semiconductor layer;
- a source region and a drain region, formed in said semiconductor layer;
- a central region having a low threshold voltage and side regions having a high threshold voltage, formed in said semiconductor layer between said source region and said drain region, said device having a first threshold value for conduction determined by said high threshold voltage of said side regions;
- a gate insulating layer formed atop said semiconductor layer;
- a gate electrode formed atop said gate insulating layer above said central and side regions;
- means for selectively applying a gate voltage to said gate electrode in excess of said first threshold voltage value of said device to establish a bias voltage in said central region of said semiconductor layer and said semiconductor layer storing said bias voltage thus established, for writing in a predetermined one of the information values "1" and "0";
- means for selectively applying a voltage between said source region and said drain region to enable a source to drain current to be conducted, the value of said current differing in accordance with the presence or absence of a bias voltage stored in said semiconductor layer in accordance with the prior, selective application of a gate voltage thereby to enable read-out of the information value stored in said device.
4 more elements
Dependencies are inferred from the claim text.