One-dimensional image sensor
AssigneeFuji Xerox Co., Ltd.
InventorsMutsuo Takenouchi, Shigeru Sadamatsu
Life of this patent
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Abstract
A one-dimensional image sensor such as may be used in scanning an original document for use in a copying system and a method for producing the sensor. Integrated drive circuit elements are formed in a relatively small region of a monocrystalline semiconductor substrate. Lead electrodes are formed on the surface of the substrate diverging outwardly from the drive circuit elements. The lead electrodes have at end portions picture element size belt-shaped electrodes. A photoconductive non-crystalline film is formed over the belt-shaped electrodes with a wide transmissive electrode layer provided over the photoconductive non-crystalline film layer.
Claims11
A one-dimensional image sensor comprising:
- integrated drive circuit elements formed in a relatively small region of a semiconductor monocrystalline substrate;
- lead electrodes extending in a divergent manner from said drive circuit elements in a surface of said substrate, said lead electrodes each having a picture element size belt-shaped electrode at an end portion thereof;
- a photoconductive non-crystalline film formed on said substrate in a predetermined region so as to cover said belt-shaped electrodes;
- and a light transmissive electrode layer provided on said photoconductive non-crystalline film.
A method for producing a one-dimensional image sensor comprising the steps of:
- providing a monocrystalline semiconductor substrate;
- forming integrated drive circuit elements in a relatively small region of said semiconductor monocrystalline substrate;
- forming lead electrodes extending from said drive circuit elements in a divergent manner upon a surface of said substrate, said lead electrodes having picture element size belt-shaped electrodes at end portions thereof;
- forming a photoconductive non-crystalline film on said substrate in a predetermined region so as to cover said belt-shaped electrodes;
- and forming a light transmissive electrode layer on said photoconductive non-crystalline film.
A method for producing a one-dimensional image sensor comprising the steps of:
- providing a monocrystalline semiconductor substrate;
- forming integrated drive circuit elements in a relatively small region of said semiconductor monocrystalline substrate;
- forming lead electrodes extending from said drive circuit elements in a divergent manner upon a surface of said substrate, said lead electrodes having picture element size belt-shaped electrodes at end portions thereof;
- forming a photoconductive non-crystalline film on said substrate in a predetermined region so as to cover said belt-shaped electrodes by depositing by vacuum evaporation a non-crystalline film consisting of 95% Se and 5% As, depositing by vacuum evaporation a film consisting of 75% Se, 20% Te and 5% As, and depositing by vacuum evaporation a film consisting of 95% Se and 5% As;
- and, forming a light transmissive electrode layer on said photoconductive non-crystalline film.
A method for producing a one-dimensional image sensor comprising the steps of:
- providing a monocrystalline semiconductor substrate;
- forming integrated drive circuit elements in a relatively small region of said semiconductor monocrystalline substrate;
- forming lead electrodes extending from said drive circuit elements in a divergent manner upon a surface of said substrate, said lead electrodes having picture element size belt-shaped electrodes at end portions thereof;
- forming a photoconductive non-crystalline film on said substrate in a predetermined region so as to cover said belt-shaped electrodes;
- and forming a light transmissive electrode layer on said photoconductive non-crystalline film by sputter depositing an ITO film.
Dependencies are inferred from the claim text.