Electron beam exposure system and an apparatus for carrying out the same
AssigneeFujitsu Limited
InventorHiroshi Yasuda
Life of this patent
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Abstract
An electron beam exposure system for projecting an electron beam onto a medium placed on a continuously moving stage, comprises a correction memory storing correction data for at least one of a field curvature, an astigmatism, and a distortion which changes in accordance with a deflection amount of the electron beam. An amount of actual deflection of the electron beam is obtained from the difference between a position data of the medium and the beam deflection position data with the electron beam then being controlled by the corresponding correction data read from the correction memory according to the amount of beam deflection.
Claims23
An electron beam exposure system in which a rectangular electron beam is radiated to a medium placed on a continuously moving stage comprising:
- a processor for providing a deflection data of said electron beam;
- means for providing a position data of said medium on said continuously moving stage;
- means for providing a beam deflection amount data in accordance with both of said deflection data and said position data;
- a correction memory for storing electron beam correction data for at least one of a field curvature, an astigmatism and a distortion corresponding to the deflection amount data of the electron beam;
- and
- control means for adjusting said electron beam in accordance with said electron beam correction data corresponding to said deflection amount data read out from said correction memory.
An electron beam exposure apparatus comprising:
- exposing means including a continuously moveable stage, a mechanism for projecting a rectangular electron beam in a variable cross-section onto a medium placed on said continuously moving stage, a deflection coil for said electron beam and electron beam adjusting means for at least one of a field curvature, astigmatism and distortion,
- means for outputting a current position signal of said continuously moving stage,
- means for storing and processing position data of said medium positioned on said continuously moving stage and said electron beam deflection,
- a subtractor for obtaining a difference between an output of said position data processing means and an output of said current position signal output means,
- an amplifier which inputs an output of said subtractor and outputs a signal for activating said deflection coil, and
- correction memory means for storing electron beam correction data for at least one of the field curvature, and astigmatism and the distortion corresponding to each deflection angle of the electron beam and activating said electron beam adjusting means in accordance with said electron beam correction data.
Dependencies are inferred from the claim text.