Apparatus for monitoring and/or controlling plasma processes
AssigneeLeybold-Heraeus GmbH
InventorsDieter Hofmann, Reiner Wechsung
Life of this patent
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AssigneeLeybold-Heraeus GmbH
InventorsDieter Hofmann, Reiner Wechsung
Estimating the term…
Apparatus for monitoring a plasma process in which a plasma is formed to occupy a specified region, which apparatus is composed of: a mass spectrometer system including a mass analyzer having an ion inlet and an ion outlet and an ion detector disposed in operative association with the ion outlet; an output device connected to the detector for providing an output signal representative of the mass spectrum of ions observed by the mass spectrometer system; and an ion-optical system having an inlet opening located in the vicinity of the specified region and disposed for extracting ions from the plasma and focussing the ions thus extracted onto the ion inlet of the analyzer, whereby the output signal produced by the output device is representative of the mass spectrum of ions in the plasma.
Apparatus for monitoring a plasma process in which a plasma is formed to occupy a specified region between two electrodes spaced a predetermined distance from each other, said apparatus comprising, in combination:
Apparatus as defined in claim 1 or 4 wherein said inlet opening is dimensioned to produce a pressure drop between the specified region and the interior of said housing.
Dependencies are inferred from the claim text.