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US 4,362,611 AGranted
Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
AssigneeInternational Business Machines Corporation
InventorsJoseph S. Logan, Steve I. Petvai, Cornel Rosu
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Abstract
A quadrupole sputtering system having four electrodes comprised of a cathode, an anode, a cathode/anode shield and an electrically floating target shield circumscribing the source target of the cathode.
Claims12
A quadrupole sputtering system comprising:
- a chamber adapted to be evacuated and to maintain a low pressure ionizable gas therein;
- a cathode electrode, disposed in said chamber, with a source target surface therein;
- an anode electrode, in said chamber, adapted for mounting work piece substrates thereon, with said anode electrode disposed in face-to-face sputtering relationship with said target surface of said cathode electrode;
- a spaced ground shield circumscribing said cathode electrode;
- an electrically floating shield circumscribing said target surface;
- and
- means for applying an operating potential between said cathode and anode electrodes for sputtering of material from said target surface on said substrates.
4 more elements
Dependencies are inferred from the claim text.