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US 4,361,643 AGranted
Photomask and method of using same
AssigneeWestern Electric Company, Inc.
InventorsEdward L. Banks, Bruce E. Truax, Laurence S. Watkins
Life of this patent
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Abstract
A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.
Claims4
A photomask, comprising:
- a light transmissive baseplate having a metallic pattern thereon;
- a light transmissive coverplate having opposed, substantially parallel major surfaces, in intimate contact with the patterned baseplate;
- and
- a refractive index matching fluid interposed between, and having substantially the same refractive index as, the baseplate and the coverplate.
1 more element
A method of selectively exposing a photoresist coated substrate to light radiation, comprising the steps of:
- positioning a photomask between a light source and the photoresist coated substrate, the photomask comprising:
- (a) a light transmissive baseplate having a metallic pattern thereon;
- (b) a light transmissive coverplate in intimate contact with the patterned baseplate;
- (c) a refractive index matching fluid interposed between, and having substantially the refractive index as, the baseplate and the coverplate;
- and
- activating the light source to direct light radiation through the photomask to selectively expose the photoresist coated substrate thereto.
3 more elements
Dependencies are inferred from the claim text.