Electrophotographic element with alpha -Si and C material doped with H and F and process for producing the same
AssigneeFuji Photo Film Co., Ltd.
InventorsAkio Higashi, Kazuhiro Kawashiri, Yuzo Mizobuchi
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Abstract
An electrophotographic light-sensitive element and process for the production thereof are described, wherein the element comprises an electrically conductive support coated with a photoconductive layer composed of a silicon- and carbon-based amorphous material doped with hydrogen and fluorine.
Claims18
An electrophotographic light-sensitive element comprising an electrically conductive support coated with a photoconductive layer composed of a silicon- and carbon-based amorphous material doped with hydrogen and fluorine, wherein the amorphous material has a carbon to silicon atomic ratio in the range of from about 0.1:1 to about 0.3:1 and wherein the amount of fluorine doped in said amorphous material is from 0.01 to 20 atomic %, based on the total amount of atomic silicon and carbon.
Dependencies are inferred from the claim text.