Apparatus for washing semiconductor materials
OwnerSeiichiro Aigoinventor
Life of this patent
Estimating the term…
Abstract
An improved apparatus for washing semiconductor materials is provided, which comprises any type of washing container in which a predetermined number of semiconductor materials held in a carrier are washed with pure water, and one or a plurality of shower devices mounted above said washing container to thereby wash the semiconductor materials held in a carrier with new pure water when the semiconductor materials are being lifted up.
Claims5
A washing device, particularly for washing articles such as processed semiconductor materials, comprising an outer case, a shallow washing container mounted in said outer case and having a bottom with a drain, a perforated carrier support plate mounted in said shallow washing container above said bottom so as to drain liquid through the perforations of said bottom and through said drain, the carrier container for articles to be washed positioned on said plate and being opened to expose the articles, a first set of shower tubes located at respective sides of said container over said plate and directing a shower spray inwardly against the articles in said carrier container, at least one second set of shower nozzle tubes located above said carrier container and directing a shower stream therebetween and in a direction toward said shower container.
Dependencies are inferred from the claim text.