Radiation induced deposition of metal on semiconductor surfaces
AssigneeBell Telephone Laboratories, Incorporated
InventorsVincent M. Donnelly, Robert F. Karlicek, Jr.
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Abstract
A metal layer is formed on a surface of a Group III-V compound semiconductor by placing the surface in contact with a metal-containing solution and directing laser radiation through the solution. The radiation has a wavelength which is absorbed in the surface, thereby thermally inducing a chemical reaction between the surface and the solution and causing metal from the solution to be deposited on the surface. Specific examples of the deposition of Pt, Au and Zn on InP and GaAs are described.
Claims14
A method of forming a metal layer on a surface of a Group III-V compound semiconductor body comprising the steps of
- (a) placing the surface in contact with a metal-containing solution;
- and
- (b) directing optical radiation through the solution to the surface, the radiation having a wavelength which is absorbed in the surface and a power density sufficient to thermally decompose said surface, thereby to thermally induce a chemical reaction between the solution and the surface and to cause metal from the solution to be deposited on the surface.
A method of forming a metal layer on a surface of a Group III-V compound semiconductor body including the steps of
- placing the surface in contact with a solution comprising a solvent selected from the group consisting of water and methanol and a solute comprising a metal salt, and
- directing laser radiation through the solution to the surface, the radiation having a wavelength which is essentially transparent in the solution but is absorbed in the surface, and the intensity of the radiation being sufficient to thermally decompose said surface thereby to induce a chemical reaction between the solution and the surface and cause metal from the solute to be deposited on the surface.
A method of forming a metal layer on a surface of a Group III-V compound semiconductor body comprising the steps of
- (a) placing the surface in contact with a metal-containing solution which by itself causes essentially no deposition of metal on said surface, and
- (b) directing optical radiation through the solution to the surface, the radiation having a wavelength which is absorbed in the surface and a power density sufficient to thermally decompose said surface, thereby to thermally induce a chemical reaction between the solution and the surface and to cause metal from the solution to be deposited on the surface.
Dependencies are inferred from the claim text.