Photocurable organopolysiloxane compositions
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMinoru Takamizawa, Fumio Okada, Yasuaki Hara, Hsashi Aoki, Yoshio Inoue
Life of this patent
Estimating the term…
Loading patent…
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMinoru Takamizawa, Fumio Okada, Yasuaki Hara, Hsashi Aoki, Yoshio Inoue
Estimating the term…
The invention provides a novel photocurable organopolysiloxane composition having an unusually high photosensitivity suitable, for example, for providing an anti-sticking layer on a release paper. The composition comprises an organopolysiloxane having, in a molecule, at least one thioacyloxy-containing organosiloxane unit as the photosensitive functional group and a photosensitizer. Further improved photocurable composition of the invention comprises an organopolysiloxane having, in addition to the above mentioned thioacyloxy-containing organosiloxane units, at least one mercaptohydrocarbyl-containing organosiloxane unit in a molecule. Alternatively, photosensitivity of the similar degree is obtained when the composition comprises a first organopolysiloxane having, in a molecule, at least one thioacyloxy-containing organosiloxane unit and a second organopolysiloxane having, in a molecule, at least one mercaptohydrocarbyl-containing organosiloxane unit as combined.
A photocurable organopolysiloxane composition which comprises
Dependencies are inferred from the claim text.