Low cost reduced blooming device and method for making the same

A method for controlling blooming in an image sensing device comprising the steps of:

• preparing a silicon wafer of a first type conductivity, said wafer having first and second major surfaces;
• forming an insulating layer on the second major surface of said wafer;
• etching a plurality of apertures through said insulating layer;
• forming a plurality of regions of a second conductivity type through said apertures;
• forming an enhanced conductivity region along said first major surface extending into said wafer;
• and
• implanting protons into the first surface of said wafer, said protons having an energy of about 80-110 keV so as to provide a dosage of approximately 4.5-5.6.times.10.sup.15 protons per square centimeter to establish a recombination layer spaced from said first surface.