Method of preparing an abrasive coated substrate
AssigneeRCA Corporation
InventorsGrzegorz Kaganowicz, John W. Robinson
Life of this patent
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Abstract
An improved method for preparing an abrasive SiO.sub.x coating wherein 1.ltoreq.x.ltoreq.2. The method includes the steps of submitting SiH.sub.4 and N.sub.2 O to glow discharge and depositing the SiO.sub.x product of the glow discharge onto a substrate. The improvement includes the additional step of adjusting the refractive index and thickness of the SiO.sub.x coating by means of the glow discharge deposition process parameters so as to maximize the abrasiveness of the SiO.sub.x coating.
Claims14
In a method for preparing an abrasive SiO.sub.x coating, wherein 1.ltoreq.x.ltoreq.2, comprising the steps of submitting SiH.sub.4 and N.sub.2 O to a glow discharge and depositing the SiO.sub.x product of the glow discharge onto a substrate;
- the improvement comprising the additional step of adjusting the refractive index and thickness of the SiO.sub.x coating by means of the glow discharge deposition process parameters so as to maximize the abrasiveness of the SiO.sub.x coating.
In a method for lapping an article comprising the steps of submitting SiH.sub.4 and N.sub.2 O to a glow discharge;
- depositing the product to obtain an abrasive SiO.sub.x coating, wherein 1.ltoreq.x.ltoreq.2, onto a substrate;
- establishing relative motion between the article and the substrate;
- and contacting the article with the abrasive SiO.sub.x coating;
- the improvement wherein the method comprises the additional step of adjusting the refractive index and thickness of the SiO.sub.x coating by means of the glow discharge deposition parameters so as to maximize the abrasiveness of the SiO.sub.x coating.
Dependencies are inferred from the claim text.