Method of applying a layer in accordance with a pattern on a substrate, a negative resist material and a substrate coated with the resist
AssigneeU.S. Philips Corporation
InventorJannes C. Jagt
Life of this patent
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Abstract
A method of providing a negative electron and/or X-ray resist material on a substrate comprising applying a layer of resist material to the substrate, exposing the layer to a pattern of electrons and/or X-rays and removing the unexposed portions of the layer of resist material in which method the resist material comprises a polyvinylcarbazole compound which (a) contains a polymer and/or a copolymer of the formula ##STR1## in which n exceeds 30 which is halogenated in the nucleus or (b) contains a mixture of the copolymer optionally halogenated in the nucleus with a bisazide of the formula N.sub.3 RN.sub.3 in which R represents an organic residue.
Claims6
In the method for forming a pattern layer on a substrate wherein a layer of a polymeric material containing resist material is applied onto the substrate, the resist material is selectively exposed to electrons or to X-rays in accordance with a pattern and the unexposed portion of the resist material is removed, the improvement wherein the polymeric material is selected from the group consisting of hetero-aromatic halogenated derivatives of the vinyl carbazole polymer defined by formula 1 of the drawing where n exceeds 30, the vinyl carbazole polymer defined by formula 1 of the drawing where n exceeds 30 and copolymers thereof, and present at least when the polymeric material is other than a hetro-aromatic halogenated derivative of the vinyl carbazole polymer, a bisazide as defined by formula 2 of the drawing wherein R is an organic residue as defined by formulae 3, 4 or 5 of the drawing.
A negative electron and/or X-ray polymeric material containing resist material which resist material comprises a mixture of a bisazide defined by formula 2 or the drawing wherein R is an organic residue as defined by formulae 3, 4 or 5 of the drawing and a polymeric material consisting of a polyvinyl carbazole as defined by formula 1 of the drawing wherein n exceeds 30, a hetero-aromatic halogenated derivative of said polyvinyl carbazole or a copolymer of said polyvinyl carbazole and said halogenated polyvinyl carbazole.
Dependencies are inferred from the claim text.