Heat-resistant heterocyclic polymers and methods for producing same

Heat-resistant heterocyclic polymers of the formula:

• ##STR68## wherein X is NH or O;
• R is ##STR69## R.sup.2 and R.sup.3 =H, C.sub.f H.sub.2f+1, C.sub.f H.sub.2f-1, ##STR70## R.sup.4 and R.sup.10 = ##STR71## R.sup.5 and R.sup.7 are the same or different and=H,C.sub.f H.sub.2f+1, C.sub.f H.sub.2f-1, ##STR72## R.sup.6 and R.sup.8 are the same or different and=C.sub.f H.sub.2f+1, C.sub.f H.sub.2f-1, ##STR73## R.sup.9 =C.sub.f H.sub.2f+1, C.sub.f H.sub.2f-1, ##STR74## f=1-5, l=1-1000, R also being an organic radical comprising at least one saturated or unsaturated hydrocarbon pentatomic cycle;
• a pentatomic heterocycle comprising at least one atom selected from the group consisting of nitrogen, sulfur and oxygen;
• a cyclic compound of boron and phosphorus or boron or phosphorus, an aromatic radical comprising halogen atoms connected directly to the aromatic fragment;
• a halogen-containing aliphatic radical of 2-1000 carbon atoms;
• an aromatic nitrile-containing radical with a nitrile group in meta position an amino or hydroxy group;
• an organic residue comprising at least one fragment selected from the group consisting of ##STR75## wherein R.sup.11 is an organic radical containing 3 to 8 atoms selected from the group consisting of carbon, nitrogen and sulfur;
• a radical of the structure:
• ##STR76## wherein R.sup.12 =--NH--CO--NH--, --NH--CO--, --NH--CO--O--, --CH.dbd.N--, R.sup.13 =H, CN, ##STR77## K=5-100, and wherein R' is an organic radical of 2-1000 carbon atoms;
• a radical of 2-1000 carbon atoms and including at least one of the elements silicon, fluorine, chlorine, bromine, nitrogen, phosphorus, boron, and oxygen, each of said elements being in an amount of 1 to 1000 atoms.