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US 4,330,864 AGranted
Double layer field shaping systems for toroidal plasmas
AssigneeGeneral Atomic Company
InventorNobuyoshi Ohyabu
Life of this patent
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Abstract
Methods and apparatus for plasma generation, confinement and control such as Tokamak plasma systems are described having a two layer field shaping coil system comprising an inner coil layer close to the plasma and an outer coil layer to minimize the current in the inner coil layer.
Claims10
Apparatus for generation and confinement of a toroidal plasma of noncircular cross section having major and minor toroidal axes, with the plasma being elongated in the direction of the major toroidal axis, comprising
- means for providing a toroidal magnetic field for plasma confinement in a plasma confinement zone,
- means for providing a toroidal current in the plasma for generation of a poloidal magnetic field,
- a field shaping coil system for shaping the plasma cross section to stabilize the plasma and axisymmetrically with respect to the major toroidal axis to elongate the plasma in a direction along the major toroidal axis comprising an inner stabilizing coil system having a coil layer comprising a plurality of inner S coil elements aligned to conduct in a direction generally along the direction of the minor toroidal axis and disposed adjacent to and surrounding the plasma confinement zone with a physical contour generally corresponding to the desired elongated outer contour of the plasma, and an outer field shaping coil system having a coil layer comprising a plurality of outer coil elements aligned to conduct in a direction generally along the direction of the minor toroidal axis and being separated from the disposed exteriorly of the inner coil layer
- the electrical currents I.sub.S of said inner coil elements and the electrical currents I.sub.F of said outer coil elements being related in each of the coil elements as follows:
- ##EQU6## where I.sub.S.sup.j is the current in the jth S coil element, I.sub.F.sup.j is the current in the jth F coil element, I.sub.F.sup.j is the current in the jth F coil element for which all S coil electrical currents are zero, M.sub.SF.sup.ij is the mutual inductance between the ith S coil element and the jth F coil element, and M.sub.SS.sup.ij is the mutual inductance between the ith S coil element and the jth S coil element and,
- programming means for controlling the currents in the F coil elements of said outer coil layer to minimize the currents I.sub.S.sup.j in the S coil elements of the inner coil layer during plasma generation and confinement.
3 more elements
Dependencies are inferred from the claim text.