Optical line width measuring apparatus and method
AssigneeRCA Corporation
InventorsHans P. Kleinknecht, Heinrich Meier
Life of this patent
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Abstract
Optical monitoring of the lateral dimensions of a pattern disposed on a substrate in the form of a wafer or mask is accomplished by testing for the lateral dimensions of a diffraction grating test pattern disposed adjacent the pattern. A beam of monochromatic light such as from a laser is diffracted by the test pattern and detectors determine the intensity of the diffracted beams. The detectors are disposed in a plane orthogonal to the plane of the test pattern and to the direction of the grating lines. The detectors are selectively spaced from each other according to the periodicity d of the grating and the width of the grating lines a is determined from a relationship of the detected intensities of the beams.
Claims15
In an apparatus for optically testing the lateral dimensions of a diffraction pattern of material disposed on a substrate, said diffraction pattern comprised of a planar array of spaced strips of material having a strip width a and a periodicity d, said apparatus including means for exposing said diffraction pattern to a beam of monochromatic light to diffract said beam into diffracted beams of various orders, detector means including detectors for measuring the intensity of at least two of the diffracted beams to obtain at least two intensity signals and means responsive to said intensity signals for determining the width a of said strips, wherein the improvement comprises:
- means for moving said detectors to respective positions in a plane to intercept said diffracted beams, said intercept plane being orthogonal to said diffraction array strips;
- wherein said detector moving means includes a pair of pivotal arms having a respective one of said detectors connected at one end of each arm, said arms being pivotally connected for rotation about an axis lying in an extension of and parallel to said diffraction array strips;
- further including means to control the spacing between said detectors to a predetermined value corresponding to the periodicity d;
- and wherein said detector spacing means includes:
- a pin on each of said pivotal arms;
- a guide member including means for positioning said guide member in a direction parallel to the plane of said diffraction array strips and perpendicular to said pivotal arms axis;
- and
- a slot in said guide member extending orthogonally to the direction of movement of said guide member and adapted to receive each of said pins to effect pivotal movement of said arms as said guide member is moved, the distance between each pin and the pivotal axis of said arms and the position of said guide member defining thereby the respective positions of said detectors.
In an apparatus for optically testing the lateral dimensions of a diffraction pattern of material disposed on a substrate, said diffraction pattern comprised of a planar array of spaced strips of material having a strip width a and a periodicity d, said apparatus including means for exposing said diffraction pattern to a beam of monochromatic light to diffract said beam into diffracted beams of various orders, detector means including detectors for measuring the intensity of at least two of the diffracted beams to obtain at least two intensity signals and means responsive to said intensity signals for determining the width a of said strips, wherein the improvement comprises:
- means for moving said detectors to respective positions in a plane to intercept said diffracted beams, said intercept plane being orthogonal to said diffraction array strips;
- wherein said diffraction pattern is supported on a transparent support made of material having a given index of refraction, further including mirror means for reflecting said beam of light through said support and said diffraction pattern, and calibrated means for positioning said mirror means to compensate for displacement errors of said beam due to said refractive index.
In a method for optically testing the lateral dimensions of a diffraction pattern of material disposed on a substrate, said diffraction pattern comprised of a planar array of spaced strips of material having a strip width a and periodicity d, said apparatus including means for exposing said diffraction pattern to a beam of monochromatic light to diffract said beam into diffracted beams of various orders, detector means including detectors for measuring the intensity of at least two of the diffracted beams to obtain at least two intensity signals and means responsive to said intensity signals for determining the width a of said strips, further comprising the steps of:
- positioning said detectors to respective positions in a plane to intercept said diffracted beams, said intercept plane being orthogonal to said diffraction array strips;
- reflecting by a positionable mirror said beam of light through a transparent support carrying said diffraction pattern;
- said transparent support being made of material having a given index of refraction;
- and
- positioning said mirror to compensate for displacement errors of said beam due to said refractive index.
Dependencies are inferred from the claim text.