Semi-open liquid phase epitaxial growth system
AssigneeRockwell International Corporation
InventorsCheng-Chi Wang, August H. B. Vanderwyck
Life of this patent
Estimating the term…
Loading patent…
AssigneeRockwell International Corporation
InventorsCheng-Chi Wang, August H. B. Vanderwyck
Estimating the term…
Disclosed is a semi-open method of growing an epitaxial HgCdTe layer on a CdTe substrate, including the steps of placing the CdTe substrate and a growth solution of Hg, Cd, and Te within a pressure and temperature controlled container, flowing an inert gas under pressure through the container to reduce the vaporization of Hg from the solution, establishing a cooling zone within the container to condense Hg vaporized from the solution, increasing the temperature of the solution for a time sufficient to react the Hg and Cd with the Te in the solution, reducing the temperature of the solution, establishing contact between the solution and the substrate, maintaining the solution at a temperature sufficient to melt the substrate for a time sufficient to eliminate a Hg vapor diffused layer, reducing the temperature of the solution to near the saturation temperature, and reducing the temperature of the solution at a rate sufficient to cause the solution to crystallize in an HgCdTe layer on the CdTe substrate.
An apparatus for growing an epitaxial layer on a substrate, comprising:
An apparatus for growing an epitaxial layer on a substrate, comprising:
Dependencies are inferred from the claim text.