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US 4,313,648 AGranted
Patterned multi-layer structure and manufacturing method
AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorsKensaku Yano, Kenji Takahashi
Life of this patent
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Abstract
A patterned multi-layer structure for a stripe filter used for a photoelectric pickup tube, comprises a protective layer preventing a substrate from being etched by reactive sputter etching and a multi-layer optical filter formed on the protective layer patterned by reactive sputter etching into a stripe pattern. The etching rate of the protective layer by an etching gas agent is not greater than that of the multi-layer filter.
Claims11
A manufacturing method for a patterned multi-layer article comprising the steps of:
- forming on a substrate a protective layer comprising at least one refractory material selected from the group consisting of aluminum oxide, zirconium oxide, cerium oxide, cerium fluoride, thorium oxide, praseodymium chloride, praseodymium oxide, lanthanum oxide and lanthanum fluoride, which is resistant to reactive sputter etching;
- forming on the protective layer a laminated layer having laminae composed of silicon oxide and titanium oxide, said silicon oxide and titanium oxide being etched at different rates by reactive sputter etching;
- and
- etching the laminated layer by reactive sputter etching to form a predetermined pattern.
1 more element
A patterned optical multi-layer article comprising:
- a substrate;
- a protective layer comprising at least one refractory material selected from the group consisting of aluminum oxide, zirconium oxide, cerium oxide, cerium fluoride, thorium oxide, praseodymium chloride, praseodymium oxide, lanthanum oxide and lanthanum fluoride formed on the surface of the substrate;
- and
- at least one laminated and patterned layer formed on the surface of said protective layer and having laminae composed of silicon oxide and titanium oxide, said silicon oxide and titanium oxide having different refractive indices,
- wherein said protective layer and said laminated and patterned layer constitute an optical filter, and said protective layer prevents said substrate from being etched by reactive sputter etching.
2 more elements
Dependencies are inferred from the claim text.