Method of and apparatus for reactively sputtering a graded surface coating onto a substrate
AssigneeThe University of Sydney
InventorsGeoffrey L. Harding, David R. McKenzie, Brian Window, Anthony R. Collins
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AssigneeThe University of Sydney
InventorsGeoffrey L. Harding, David R. McKenzie, Brian Window, Anthony R. Collins
Estimating the term…
A graded surface coating is reactively sputtered onto a tubular substrate by advancing the substrate in an axial direction through a cylindrical sputtering chamber in the presence of a sputter supporting gas. The sputtering chamber includes a cathode liner from which metal is sputtered onto the substrate. A reactive gas is directed into the sputtering chamber from a feed point outside of the chamber, whereby reactive sputtering occurs within the chamber. The reactive gas is induced to flow into the chamber in a direction counter to the direction of advancement of the substrate whereby, as the substrate is progressively advanced through the chamber and the applied coating gradually increases in thickness, the proportion of the reactive gas constituent in the coating increases relative to the metal constituent proportion with increasing thickness of the coating.
A method of applying a graded surface coating to a substrate and which comprises:
An apparatus for applying a graded surface coating to a substrate and which comprises:
An apparatus for applying a graded solar selective surface coating to a substrate and which comprises:
Dependencies are inferred from the claim text.