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US 4,309,259 AGranted
High pressure plasma hydrogenation of silicon tetrachloride
AssigneeMotorola, Inc.
InventorsKalluri R. Sarma, M. John Rice, Jr.
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Abstract
A method is disclosed for the plasma hydrogenation of silicon tetrachloride. A high pressure plasma is utilized to effect a reaction of hydrogen and silicon tetrachloride to form trichlorosilane and other hydrogenated silicon chlorides.
Claims7
A method for producing SiHCl.sub.3 and SiH.sub.2 Cl.sub.2 which comprises:
- creating a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa);
- and reacting H.sub.2 and SiCl.sub.4 in said high pressure radio frequency plasma to form SiHCl.sub.3 and SiH.sub.2 Cl.sub.2.
A process for the hydrogenation of silicon tetrachloride to form SiHCl.sub.3 and SiH.sub.2 Cl.sub.2 in an apparatus capable of producing a high pressure radio frequency plasma which comprises the steps of:
- initiating a high pressure radio frequency hydrogen plasma in the apparatus at a pressure of about one atmosphere (about 101 KPa);
- introducing hydrogen to the plasma through a first means;
- introducing silicon tetrachloride to the plasma through a second means;
- and combining the hydrogen and silicon tetrachloride in the presence of said plasma to form SiHCl.sub.3 and SiH.sub.2 Cl.sub.2.
1 more element
A method for producing SiHCl.sub.3 and SiH.sub.2 Cl.sub.2 which comprises:
- creating in a volume a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa);
- introducing reactants comprising hydrogen and silicon tetrachloride to said volume;
- and creating with said reactants a high pressure radio frequency plasma, said reactants combining in said plasma to form SiHCl.sub.3 and SiH.sub.2 Cl.sub.2 without the production of substantial amounts of chlorosilane polymers.
Dependencies are inferred from the claim text.