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AssigneeU.S. Philips Corporation
InventorsTheodorus G. J. van Oirschot, Willem Nijman, Marc P. A. Fougeres
Estimating the term…
In an arrangement for providing a layer of semiconductor material on a flat side of a substrate from a solution which contains the semiconductor material, the substrate is provided in a recess of a substrate holder which closes the lower side of the reservoir containing the solution. By a relative displacement of the reservoir relative to the substrate holder, the flat side of the substrate is moved below or away from the solution present in the reservoir. The flat side of the substrate is brought to a desired height relative to the lower side of the reservoir, and solution from the reservoir is provided on the substrate. When the reservoir is removed relative to the substrate, a quantity of solution at an adjustable height is left on the substrate.
A device for providing an epitaxial semiconductor material layer on a substrate, comprising a slide mechanism that comprises a reservoir holder and a substrate holder, said reservoir holder comprising at least one aperture for holding a solution which contains said semiconductor material and said substrate holder having at least one recess that extends completely therethrough and in which a substrate can be provided, an adjusting member slidably related to said substrate holder, a support element disposed in said recess of said substrate holder so as to support said substrate and permit the height adjustment thereof with respect to said aperture, said support element comprising an upper surface at which said substrate is located and a lower side that contacts said adjusting member and being adjustable in the height direction, with which support element said substrate support can be adjusted in the height direction relative to the lower side of said reservoir, said adjusting member and said support element co-acting to permit such a substrate located in the recess of the substrate holder to be removed from said recess and carried away by said support to said at least one aperture holding said solution.
A device for providing an epitaxial semiconductor material layer on a substrate, comprising a slide mechanism that comprises a reservoir holder and a substrate holder, said reservoir holder comprising at least one aperture for holding a solution which contains said semiconductor material and said substrate holder having at least one recess that extends completely therethrough and in which a substrate can be provided, an adjusting member, a support element disposed in said recess of said substrate holder so as to support said substrate and permit the height adjustment thereof with respect to said aperture, said support element comprising an upper surface at which said substrate is located and a lower side that contacts said adjusting member with which said substrate support can be adjusted in the height direction relative to the lower side of said reservoir holder, said adjusting member consisting of a rod that is laterally immobile relative to said substrate support element and is rotatable about longitudinal axis, said rod comprising one of a cam and an eccentric circular disk which contacts the lower side of said support element, whereby such a substrate in the recess of said substrate holder can be removed therefrom and carried away by said support element which is adjustable in the height direction.
Dependencies are inferred from the claim text.