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AssigneeFuji Photo Film Co., Ltd.
InventorsTakenori Omichi, Takeshi Konno, Sumitaka Tatsuta
Estimating the term…
A process for producing a photographic light-sensitive material comprising providing a first light-sensitive photographic emulsion layer on one side of a support having a surface resistivity greater than 10.sup.14 .OMEGA. and a thickness of not more than 230.mu. and providing a light-sensitive photographic emulsion layer or a gelatin-containing back layer on the opposite side of the support wherein between the time the first emulsion layer is coated and the time the opposite surface of the support is coated, (i) the opposite surface of the support is prevented from coming into contact with anything except rolls having a diameter larger than about 50 mm, and (ii) the water/gelatin weight ratio in the photographic emulsion layer(s) coated on the first surface of the support prior to coating the second surface is not less than 1. The process is particularly applicable to production of X-ray films.
In a process for producing a photographic light-sensitive material comprising providing a light-sensitive photographic emulsion layer directly on a first surface of a support having a surface resistivity greater than 10.sup.14 .OMEGA. and a thickness not more than 230.mu., and providing a second light-sensitive photographic emulsion layer or gelatin back layer directly on the second surface of the support, the improvement which comprises achieving sufficient adhesion between said layers and said support and preventing static marks by a method which comprises during the period from the coating of the first surface of the support to coating the second surface, (i) the second surface is prevented from coming into contact with anything except air or rolls having a diameter larger than about 50 mm, and (ii) the water/gelatin weight ratio in the layer(s) coated on the first surface of the support is not less than 1.
Dependencies are inferred from the claim text.