Thermally developable light-sensitive materials
AssigneeFuji Photo Film Co., Ltd.
InventorsShinpei Ikenoue, Takao Masuda
Life of this patent
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Abstract
A thermally developable light-sensitive material comprising a support having provided therein or thereon at least one layer containing at least (a) an organic silver salt, (b) light-sensitive silver halide or a component capable of forming a light-sensitive silver halide, and (c) a reducing agent, the support further having provided therein or thereon at least one layer containing (d) at least one thiosulfonic acid. In a highly preferred embodiment, (e) one or more benzotriazoles are also present.
Claims31
A mercury free thermally developable light-sensitive material comprising a support having provided therein or thereon at least one layer containing at least
- (a) a silver salt of a straight chain acid having 10 or more carbon atoms,
- (b) silver halide at least partially formed by the reaction of an N-halo compound, and
- (c) a reducing agent,
- the support having provided therein or thereon at least one layer containing
- (d) at least one thiosulfonic acid represented by the following general formula
- RSO.sub.2 SM
- wherein R represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aryl group and M represents a cation other than hydrogen.
The thermally-developable light-sensitive material as claimed in 1, wherein component (d) included a 2-thiouracil represented by the formula ##STR24## wherein R.sub.1 represents a hydrogen atom, a hydroxy group, an alkoxy group, a halogen atom, a substitute lower alkyl group or an unsubstituted alkyl group, a benzyl group, an allyl group, an amino group, a nitro group or a nitroso group, and R.sub.2 represents a hydrogen atom, a hydroxy group, a halogen atom, an amino group, an acetoamido group, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms, an aryl group or a substituted aryl group.
Dependencies are inferred from the claim text.