Process of making and using fade-resistant diazo microfilm
AssigneeAM International, Inc.
InventorEdward C. Bialczak
Life of this patent
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Abstract
A diazo microfilm which is resistant to fading upon exposure to strong light for extended periods of time is provided. The fade-resistant diazo microfilm is produced by saponifying a cellulose alkanoate film to an extent defined by certain infrared absorption parameters.
Claims6
A process comprising reproducing images on diazo microfilm that includes a partially saponified cellulose ester film and a two-component light-sensitive diazo composition comprising an acid stabilized combination of a photosensitive diazonium compound and an azo coupler in the partially saponified cellulose ester, the saponification being sufficient to limit fading of the reproduced images to less than about 30% upon exposure of said images to strong light for a period of about 16 hours, said process including exposing said microfilm to a light image, developing said image with an alkaline developer, and exposing the developed image to said strong light in a microfilm reader.
Dependencies are inferred from the claim text.