Negative-working polymers useful as electron beam resists
AssigneeEastman Kodak Company
InventorsZoilo C. H. Tan, Constantine C. Petropoulos, Frederick J. Rauner
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Abstract
Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.
Claims12
A polymer having a negative-working electron sensitivity of at least 2.times.10.sup.-7 coulombs/cm.sup.2 when exposed to a 10 keV electron beam,
- said polymer having recurring units with the sructure ##STR7## wherein R and R.sup.1 are each independently hydrogen or methyl,
- R.sup.2 is ##STR8## n is 1, 2, or 3;
- R.sup.3 is alkylene of from 1 to 3 carbon atoms;
- T is --O-- or --NH--;
- and
- x and y are mole percents such that
- 5.ltoreq. x.ltoreq.95
- 5.ltoreq.y.ltoreq.50.
A polymer having a negative-working electron sensitivity of at least 2.times.10.sup.-7 coulombs/cm.sup.2 when exposed to a 10 keV electron beam,
- said polymer having recurring units with the structure ##STR9## wherein R and R.sup.1 are each independently hydrogen or methyl,
- R.sup.3 and R.sup.4 are each independently alkylene of from 1 to 3 carbon atoms;
- T is --O-- or --NH--;
- and
- x and y are mole percents such that
- 5.ltoreq. x.ltoreq.95
- 5.ltoreq.y.ltoreq.50.
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 50 and about 95 mole percent.
Poly[4-but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 50 and about 95 mole percent.
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide).sub.x:(100-x) wherein x is between about 50 and about 95 mole percent.
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 50 and about 95 mole percent.
Poly[allyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 70 and about 75 mole percent.
Poly[but-1-enyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 70 and about 75 mole percent.
Poly(allyl methacrylate-co-2-hydroxypropylmethacrylamide).sub.x:(100-x) wherein x is between about 70 and about 75 mole percent.
Poly[3-norbornenyl methacrylate-co-(2-hydroxyethyl methacrylate)].sub.x:(100-x) wherein x is between about 70 and about 75 mole percent.
Dependencies are inferred from the claim text.