Phosphorus-nitrogen-oxygen composition and method for making such composition and applications of the same
AssigneeInternational Business Machines Corporation
InventorPei-Ching Li
Life of this patent
Estimating the term…
Abstract
A composition is described which comprises amorphous phosphorus-nitrogen-oxygen material having excellent thermal stability and low reactivity to a wide variety of chemicals. The material is manufactured using a chemical vapor deposition process. The reaction chamber is maintained at a temperature between about 400.degree.-900.degree. C. with a suitable substrate placed therein. Reaction gases containing phosphorus-nitrogen-bearing compounds and a source of oxygen are passed through the chamber to deposit the phosphorus-nitrogen-oxygen film onto the substrate.
Claims6
A coating composition comprising gaseous phosphorus-nitrogen-oxygen material having about 16 to 27 percent by weight of oxygen;
- the dielectric breakdown strength on bare silicon of the amorphous film resulting from the application of said coating composition being between about 10 to 20.times.10.sup.6 volts/cm based on equivalent oxide thickness.
The coating composition for diffusing phosphorus comprising a gaseous phosphorus-oxygen-nitrogen material containing about 47 to 51 percent phosphorus by wt.;
- the dielectric breakdown strength on bare silicon of the amorphous film resulting from the application of said coating composition being between about 10 to 20.times.10.sup.6 volts/cm based on equivalent oxide thickness.
Dependencies are inferred from the claim text.