Photoresist of polyvinyl alcohol and ferric dichromate
AssigneeGTE Laboratories Incorporated
InventorsKurt B. Kilichowski, Peter Cukor, Charles Brecher
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Abstract
To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.
Claims11
A method of enhancing the sensitivity of a cross-linkable poly(vinyl alcohol)photoresist to radiation in the visible region of the spectrum comprising incorporating a ferric dichromate into a cross-linkable poly(vinyl alcohol) photoresist-forming composition thereby enhancing the absorptive sensitivity of the photoresist in the visible region of the spectrum.
An improved photoresist composition enhanced sensitivity to radiation in the visible region of the spectrum comprising a mixture of poly(vinyl alcohol) and ferric dichromate.
Dependencies are inferred from the claim text.